In-Situ Studies of the Oxide Film Properties on BWR Fuel Cladding Materials

Author(s):  
M Bojinov ◽  
L Hansson-Lyyra ◽  
P Kinnunen ◽  
T Saario ◽  
P Sirkiä
2005 ◽  
Vol 2 (4) ◽  
pp. 12820 ◽  
Author(s):  
M Bojinov ◽  
L Hansson-Lyyra ◽  
P Kinnunen ◽  
T Saario ◽  
P Sirkiä

Author(s):  
J. V. Maskowitz ◽  
W. E. Rhoden ◽  
D. R. Kitchen ◽  
R. E. Omlor ◽  
P. F. Lloyd

The fabrication of the aluminum bridge test vehicle for use in the crystallographic studies of electromigration involves several photolithographic processes, some common, while others quite unique. It is most important to start with a clean wafer of known orientation. The wafers used are 7 mil thick boron doped silicon. The diameter of the wafer is 1.5 inches with a resistivity of 10-20 ohm-cm. The crystallographic orientation is (111).Initial attempts were made to both drill and laser holes in the silicon wafers then back fill with photoresist or mounting wax. A diamond tipped dentist burr was used to successfully drill holes in the wafer. This proved unacceptable in that the perimeter of the hole was cracked and chipped. Additionally, the minimum size hole realizable was > 300 μm. The drilled holes could not be arrayed on the wafer to any extent because the wafer would not stand up to the stress of multiple drilling.


2020 ◽  
Vol 30 ◽  
pp. 53-58
Author(s):  
Kirill Kurgan ◽  
Anatoliy Klopotov ◽  
Vasiliy Klimenov ◽  
Michael Slobodyan ◽  
Artem Ustinov ◽  
...  

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