High Rate MW-Plasma-CVD Deposition for Hard Coatings on Large PC Glazing: First Results Make TMCTS a Promising Precursor Candidate

2019 ◽  
Author(s):  
Klaus-Dieter Nauenburg ◽  
Keyword(s):  
Hard Coatings ◽  
High Rate ◽  
Plasma Cvd ◽  
First Results ◽  
Precursor Candidate

Elastic Properties of Sputtered Thin Films: Influence of Different Preparation Conditions

1993 ◽  
Vol 308 ◽  
Author(s):  
C.E. Bottani ◽  
M. Elena ◽  
M. Beghi ◽  
G. Ghislotti ◽  
L. Guzman ◽  
...  
Keyword(s):  
Thin Films ◽  
Light Scattering ◽  
Hard Coatings ◽  
Elastic Behaviour ◽  
Internal Stresses ◽  
Pvd Coatings ◽  
Tin Films ◽  
Si Substrates ◽  
Preparation Conditions ◽  
First Results

ABSTRACTThis work presents the first results of a study aimed at better understanding the elastic behaviour of hard coatings produced by various techniques. This is important also in view of the need to be able to control the level of internal stresses, particularly in PVD coatings. It is well known that in extreme cases excessive internal stress can lead to complete film destruction. We devote this paper to reactively magnetron sputtered TiN, one of the most widely used compounds. Thin TiN films of different compositions were deposited on Si substrates and characterized by SEM, AES, XRD and Brillouin light scattering.

scholarly journals Super High Rate Thermal Plasma CVD of Ceramics

1989 ◽  
Vol 97 (1121) ◽  
pp. 49-55 ◽  
Author(s):  
Hideyuki MURAKAMI ◽  
Hifumi NAGAI ◽  
Tohru IROKAWA ◽  
Toyonobu YOSHIDA ◽  
Kazuo AKASHI
Keyword(s):  
Thermal Plasma ◽  
High Rate ◽  
Plasma Cvd

Towards Stabilized 10% Efficiency of Large-Area (> 5000cm2) a-Si/a-SiGe Tandem Solar Cells using High-Rate Deposition

2001 ◽  
Vol 664 ◽  
Author(s):  
Shingo Okamoto ◽  
Akira Terakawa ◽  
Eiji Maruyama ◽  
Wataru Shinohara ◽  
Makoto Tanaka ◽  
...  
Keyword(s):  
Solar Cells ◽  
Layer Structure ◽  
High Rate ◽  
Plasma Cvd ◽  
Large Area ◽  
Tandem Solar Cells ◽  
Cvd Method ◽  
Hydrogen Dilution ◽  
High Photosensitivity ◽  
Deposition Conditions

ABSTRACTThis paper reviews recent progress in large-area a-Si/a-SiGe tandem solar cells in Sanyo. Much effort has been devoted to increasing both the stabilized efficiency and the process throughput. A key issue in increasing the stabilized efficiency is thinner i-layer structure with an improved optical confinement effect. High-rate deposition of the i-layers has been investigated using rf (13.56MHz) plasma-CVD method while keeping the substrate temperature below 200 °C. A high photosensitivity of 106 of a-Si:H films maintain up to the deposition rate (Rd) of 15 Å/s by optimizing hydrogen dilution and other deposition conditions. It is of great importance to utilize the effect of hydrogen dilution which can reduce the incorporation of excess hydrogen in the films. The world's highest conversion efficiency of 11.2% has been achieved for a large-area (8252cm2) a-Si/a-SiGe tandem by combining the optimized hydrogen dilution and other solar cell related technologies.

Hard coatings by plasma CVD on polycarbonate for automotive and optical applications

2006 ◽  
Vol 502 (1-2) ◽  
pp. 270-274 ◽  
Author(s):  
T. Schmauder ◽  
K.-D. Nauenburg ◽  
K. Kruse ◽  
G. Ickes
Keyword(s):  
Hard Coatings ◽  
Plasma Cvd ◽  
Optical Applications

The effect of nitrogen addition during high-rate homoepitaxial growth of diamond by microwave plasma CVD

2004 ◽  
Vol 13 (11-12) ◽  
pp. 1954-1958 ◽  
Author(s):  
A. Chayahara ◽  
Y. Mokuno ◽  
Y. Horino ◽  
Y. Takasu ◽  
H. Kato ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Nitrogen Addition ◽  
High Rate ◽  
Plasma Cvd ◽  
Homoepitaxial Growth ◽  
Microwave Plasma Cvd
Sign in / Sign up

Export Citation Format

Share Document