scholarly journals Modifing the Surface Layers of Mechanical Components

10.14311/410 ◽  
2003 ◽  
Vol 43 (2) ◽  
Author(s):  
K. Slanec ◽  
F. Černý ◽  
J. Gurovič ◽  
V. Chmelík
Keyword(s):  
Layer Thickness ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Deposition Method ◽  
Surface Layers ◽  
Process Duration ◽  
Original Surface ◽  
Surface Areas ◽  
Coated Surface ◽  
Chemical Vapour Deposition Method

This paper deals with the creation of thin surface layers prepared by the Plasma Assisted Chemical Vapour Deposition Method (PACVD). Polished sample surfaces made of tool steel were used. An investigation of the dependence of layer thickness on process duration was carried out. The structure of the original surface and the structure of the coated surface were evaluated and compared. The microhardness of the surface areas was also measured.

scholarly journals DLC Films Deposited by the DC PACVD Method

10.14311/398 ◽  
2003 ◽  
Vol 43 (1) ◽  
Author(s):  
D. Palamarchuk ◽  
M. Zoriy ◽  
J. Gurovič ◽  
F. Černý ◽  
S. Konvičková ◽  
...  
Keyword(s):  
Vapour Deposition ◽  
Chemical Vapour ◽  
Diamond Like Carbon ◽  
Deposition Method ◽  
Surface Layers ◽  
Carbon Coatings ◽  
Dlc Coatings ◽  
Steel Substrates ◽  
Poor Adhesion ◽  
Chemical Vapour Deposition Method

DLC (Diamond-Like Carbon) coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition) method on steel substrates. One of these is the DC PACVD method for preparing DLC films.

Thermal evaporation synthesis of SiC/SiOx nanochain heterojunctions and their photoluminescence properties

2014 ◽  
Vol 2 (37) ◽  
pp. 7761-7767 ◽  
Author(s):  
Haitao Liu ◽  
Zhaohui Huang ◽  
Juntong Huang ◽  
Minghao Fang ◽  
Yan-gai Liu ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Thermal Evaporation ◽  
Chemical Vapour ◽  
Deposition Method ◽  
Photoluminescence Properties ◽  
Catalyst Free ◽  
Chemical Vapour Deposition Method

Chainlike SiC/SiOx heterojunctions were prepared on a silicon wafer by a simplified catalyst-free thermal chemical vapour deposition method.

scholarly journals Effect of Deposition Temperature on Self-Catalyzed ZnO Nanorods via Chemical Vapour Deposition Method

2018 ◽  
Vol 11 (1) ◽  
pp. 209 ◽  
Author(s):  
Shafinaz Sobihana Shariffudin ◽  
Puteri Sarah Mohamad Saad ◽  
Hashimah Hashim ◽  
Mohamad Hafiz Mamat
Keyword(s):  
Chemical Vapour Deposition ◽  
Deposition Temperature ◽  
Vapour Deposition ◽  
Zno Nanorods ◽  
Chemical Vapour ◽  
Catalyst Layer ◽  
Deposition Method ◽  
Current Increase ◽  
Axis Orientation ◽  
Chemical Vapour Deposition Method

The morphological, structural, optical and electrical properties of ZnO nanorods are investigated as a function of deposition temperature. The ZnO nanorods were grown on ZnO seed catalyst layer at temperatures between 750oC – 825oC using thermal chemical vapour deposition method.  Sample deposited at 825oC showed the highest crystalline orientation. The FE-SEM micrographs and the intense peak along (002) direction in the XRD spectra of this sample implied that the nanorods possess c-axis orientation. PL spectra showed two common ZnO peaks which centered at 380 nm and 540 nm. Two-point probe I-V measurement revealed ohmic behaviour with the gold metal contact, whereby the current increase with the deposition temperature.

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