To Extract Full Performances of Residual Gas Analyzer (2) Other Disturbance in RGA Sensor Head and Its Solution

Shigeki KATO

doi:10.1380/vss.62.369

To Extract Full Performances of Residual Gas Analyzer (2) Other Disturbance in RGA Sensor Head and Its Solution

Vacuum and Surface Science ◽

10.1380/vss.62.369 ◽

2019 ◽

Vol 62 (6) ◽

pp. 369-376

Author(s):

Shigeki KATO

Keyword(s):

Gas Analyzer ◽

Sensor Head ◽

Residual Gas

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Non-invasive breath test by residual gas analyzer-mass spectrometry: a new method for detection of pre-diabetes and type 2 diabetes

Diabetologie und Stoffwechsel ◽

10.1055/s-0037-1601797 ◽

2017 ◽

Vol 12 (S 01) ◽

pp. S1-S84

Author(s):

C Ghosh ◽

M Pradhan

Keyword(s):

Mass Spectrometry ◽

Type 2 Diabetes ◽

Breath Test ◽

New Method ◽

Gas Analyzer ◽

Non Invasive ◽

Residual Gas

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Silicon Oxide Etching Process of NF3 and F3NO Plasmas with a Residual Gas Analyzer

Materials ◽

10.3390/ma14113026 ◽

2021 ◽

Vol 14 (11) ◽

pp. 3026

Author(s):

Woo-Jae Kim ◽

In-Young Bang ◽

Ji-Hwan Kim ◽

Yeon-Soo Park ◽

Hee-Tae Kwon ◽

...

Keyword(s):

Greenhouse Gas ◽

Silicon Oxide ◽

Gas Analysis ◽

Gas Analyzer ◽

Dc Offset ◽

Cleaning Performance ◽

Oxide Etching ◽

Residual Gas ◽

Etch Rates ◽

Very High

The use of NF3 is significantly increasing every year. However, NF3 is a greenhouse gas with a very high global warming potential. Therefore, the development of a material to replace NF3 is required. F3NO is considered a potential replacement to NF3. In this study, the characteristics and cleaning performance of the F3NO plasma to replace the greenhouse gas NF3 were examined. Etching of SiO2 thin films was performed, the DC offset of the plasma of both gases (i.e., NF3 and F3NO) was analyzed, and a residual gas analysis was performed. Based on the analysis results, the characteristics of the F3NO plasma were studied, and the SiO2 etch rates of the NF3 and F3NO plasmas were compared. The results show that the etch rates of the two gases have a difference of 95% on average, and therefore, the cleaning performance of the F3NO plasma was demonstrated, and the potential benefit of replacing NF3 with F3NO was confirmed.

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