Ground fused silica processed by combined chemical etching and CO2 laser polishing with super-smooth surface and high damage resistance

2020 ◽  
Vol 45 (21) ◽  
pp. 6014
Author(s):  
Zhen Cao ◽  
Chaoyang Wei ◽  
Xin Cheng ◽  
Yuanan Zhao ◽  
Xiaocong Peng ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Chemical Etching ◽  
Smooth Surface ◽  
Fused Silica ◽  
Damage Resistance ◽  
Laser Polishing

Super-smooth surface demonstration and the physical mechanism of CO2 laser polishing of fused silica

2018 ◽  
Vol 43 (23) ◽  
pp. 5777 ◽  
Author(s):  
Ting He ◽  
Chaoyang Wei ◽  
Zhigang Jiang ◽  
Yuanan Zhao ◽  
Jianda Shao
Keyword(s):  
Co2 Laser ◽  
Smooth Surface ◽  
Physical Mechanism ◽  
Fused Silica ◽  
Laser Polishing

Effects of Wet Chemical Etching on Scratch Morphology and Laser Damage Resistance of Fused Silica

Silicon ◽  
2019 ◽  
Vol 12 (2) ◽  
pp. 425-432 ◽  
Author(s):  
Hui Ye ◽  
Yaguo Li ◽  
Qiao Xu ◽  
Wei Yang ◽  
Chen Jiang
Keyword(s):  
Chemical Etching ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Wet Chemical ◽  
Wet Chemical Etching

scholarly journals The influence of CO2 laser local irradiation on the laser damage resistance of fused silica

2013 ◽  
Vol 62 (9) ◽  
pp. 094701
Author(s):  
Liu Chun-Ming ◽  
Yang Liang ◽  
Yan Zhong-Hua ◽  
Jiang Yong ◽  
Wang Hai-Jun ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Fused Silica ◽  
Laser Damage ◽  
Local Irradiation ◽  
Damage Resistance

scholarly journals Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1226
Author(s):  
Wanli Zhang ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
Yongxiang Shen
Keyword(s):  
Chemical Etching ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Etching Depth ◽  
Treatment Processes ◽  
Laser Induced Damage ◽  
Combined Technique

The enhancement of laser damage resistance of fused silica optics was a hotspot in scientific research. At present, a variety of modern processes have been produced to improve the laser induced damage threshold (LIDT) of fused silica optics. They included pre-treatment processes represented by flexible computer controlled optical surfacing (CCOS), magnetorheological finishing (MRF), ion beam finishing (IBF), and post-treatment processes represented by dynamic chemical etching (DCE). These have achieved remarkable results. However, there are still some problems that need to be solved urgently, such as excessive material removal, surface accuracy fluctuation in the DCE process, and the pollution in MRF process, etc. In view of above problems, an MRF, CCOS, IBF and shallow DCE combined technique was used to process fused silica optics. The surface morphology could be greatly controlled and chemical etching depth was reduced, while the LIDT increased steadily. After processing by this combined technique, the LIDT increased to 12.1 J/cm2 and the laser damage resistance properties of fused silica were significantly enhanced. In general, the MRF, IBF, CCOS and shallow DCE combined technique brought much help to the enhancement of laser damage resistance of fused silica, and could be used as a process route in the manufacturing process of fused silica.

Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces

2016 ◽  
Vol 41 (19) ◽  
pp. 4464 ◽  
Author(s):  
Laixi Sun ◽  
Jin Huang ◽  
Hongjie Liu ◽  
Xin Ye ◽  
Jingjun Wu ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Fused Silica ◽  
Laser Damage ◽  
Ion Etching ◽  
Damage Resistance ◽  
Optical Surfaces

Surface evolution and laser damage resistance of CO2 laser irradiated area of fused silica

2011 ◽  
Vol 49 (2) ◽  
pp. 273-280 ◽  
Author(s):  
W. Dai ◽  
X. Xiang ◽  
Y. Jiang ◽  
H.J. Wang ◽  
X.B. Li ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Fused Silica ◽  
Laser Damage ◽  
Surface Evolution ◽  
Damage Resistance
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