An ultra-high plasmonic refractive index sensing structure composed of a metal–insulator–metal (MIM) waveguide coupled to a T-shape cavity and several metal nanorod defects is proposed and investigated by using finite element method. The designed plasmonic MIM waveguide can constitute a cavity resonance zone and the metal nanorod defects can effectively trap the light in the T-shape cavity. The results reveal that both the size of defects in wider rectangular cavity and the length of narrower rectangular cavity are primary factors increasing the sensitivity performance. The sensitivity can achieve as high as 8280 nm/RIU (RIU denotes the refractive index unit), which is the highest sensitivity reported in plasmonic MIM waveguide-based sensors to our knowledge. In addition, the proposed structure can also serve as a temperature sensor with temperature sensitivity as high as 3.30 nm/°C. The designed structure with simplicity and ease of fabrication can be applied in sensitivity nanometer scale refractive index sensor and may potentially be used in optical on-chip nanosensor.
Silicon On-chip 1D Photonic Crystal Nanobeam Bandgap Filter Integrated with Nanobeam Cavity for Accurate Refractive Index Sensing