Optical Characteristics of Low-Refractive-Index Optical Thin Films Fabricated by Sputtering and Electron-Beam Vacuum Deposition

2019 ◽  
Author(s):  
Mai Hayamizu ◽  
Yoshiki Tsuno ◽  
Hiroshi Murotani ◽  
Shigeharu Matsumoto
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Electron Beam ◽  
Optical Characteristics ◽  
Vacuum Deposition ◽  
Low Refractive Index

Vacuum deposition of chitosan thin films by electron beam sputtering

2015 ◽  
Vol 49 (3) ◽  
pp. 213-215 ◽  
Author(s):  
T. S. Demina ◽  
M. Yu. Yablokov ◽  
A. B. Gilman ◽  
A. I. Gaidar ◽  
T. A. Akopova ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Vacuum Deposition ◽  
Beam Sputtering

Optical Thin Films with Extremely Low Refractive Index

2006 ◽  
Author(s):  
J.-Q. Xi ◽  
Jong Kyu Kim ◽  
Dexian Ye ◽  
Jasbir S. Juneja ◽  
T.-M. Lu ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Low Refractive Index

Optical and hydrophobic nano-porous silica thin films with low refractive index

2006 ◽  
Author(s):  
Lanfang Yao ◽  
Yongan Zhu ◽  
Dian Qu ◽  
Meifang Du ◽  
Jun Shen ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Porous Silica ◽  
Silica Thin Films ◽  
Low Refractive Index

Epitaxial Growth And Optical Properties of Sol-Gel (Pb,La)Ti03 Thin Films for Waveguides

1997 ◽  
Vol 474 ◽  
Author(s):  
Junmo Koo ◽  
Changho Lee ◽  
Kwangsoo No ◽  
Byeong-Soo Bae
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
Refractive Index ◽  
Laser Light ◽  
Sol Gel ◽  
Surface Scattering ◽  
Sapphire Substrates ◽  
Lanthanum Titanate ◽  
Propagation Losses ◽  
Low Refractive Index

ABSTRACTLead lanthanum titanate thin films have been prepared on MgO and sapphire substrates by sol-gel method. XRD analyses confirm that the PLT films fabricated on MgO(lOO) and c-plane sapphire substrates grow preferentially with (100) and (111) orientations, respectively. The PLT films with a high La content have a low refractive index due to the decrease of the refractive index anisotropy. The propagation losses in PLT films measured, using He-Ne laser light and the prism coupling method decrease as the La content increases. This is due to the reduction of the refractive index anisotropy and the surface scattering by the surface roughness as a function of La content in the film.

Preparation of MgF_2-SiO_2 thin films with a low refractive index by a solgel process

2008 ◽  
Vol 47 (13) ◽  
pp. C200 ◽  
Author(s):  
Hitoshi Ishizawa ◽  
Shunsuke Niisaka ◽  
Tsuyoshi Murata ◽  
Akira Tanaka
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Low Refractive Index

Influence of the Microstructure on the Optical Characteristics of SrTiO3 thin films

2005 ◽  
Vol 20 (1) ◽  
pp. 68-74 ◽  
Author(s):  
M. Gaidi ◽  
L. Stafford ◽  
A. Amassian ◽  
M. Chaker ◽  
J. Margot ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
Rutherford Backscattering Spectrometry ◽  
Optical Characteristics ◽  
Silicon Substrates ◽  
Deposition Pressure ◽  
X Ray ◽  
Full Characterization

The influence of the microstructure of strontium-titanate-oxide (SrTiO3 or STO) thin films on their optical properties was investigated through an extensive characterization. The STO films have been deposited on silicon substrates by reactive pulsed laser deposition. The effect of the oxygen deposition pressure on the crystalline quality of the films was systematically studied by x-ray diffraction and scanning electron microscopy. Rutherford backscattering spectrometry, x-ray photoelectron spectroscopy, and secondary ion mass spectrometry were used to determine the atomic density and depth concentration profiles of the various species forming the film. The refractive index and extinction coefficient were obtained using variable angle spectroscopic ellipsometry. Based on this full characterization, it is demonstrated that the optical characteristics of the films are directly correlated to their microstructural properties. In particular, the refractive index increases with film density, while losses decrease. In addition, the interface between STO and Si is characterized by an interdiffusion layer. As the deposition pressure is enhanced, the width of this layer significantly increases, inducing localized inhomogeneity of the refractive index.

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