Correlation of Optical Properties and Laser Damage Resistance for Ion Beam Sputtered Al2O3/AlF3 and Al2O3/SiO2 Mixture Coatings

2013 ◽  
Author(s):  
Mathias Mende ◽  
Istvan Balasa ◽  
Henrik Ehlers ◽  
Detlev Ristau ◽  
Dam-Bé Lardja Douti ◽  
...  
Keyword(s):  
Optical Properties ◽  
Ion Beam ◽  
Laser Damage ◽  
Damage Resistance

Laser damage resistance of ion-beam sputtered Sc2O3/SiO2 mixture optical coatings

2013 ◽  
Vol 52 (7) ◽  
pp. 1368 ◽  
Author(s):  
Mathias Mende ◽  
Stefan Schrameyer ◽  
Henrik Ehlers ◽  
Detlev Ristau ◽  
Laurent Gallais
Keyword(s):  
Ion Beam ◽  
Laser Damage ◽  
Optical Coatings ◽  
Damage Resistance

Relation of optical properties and femtosecond laser damage resistance for Al2O3/AlF3 and Al2O3/SiO2 composite coatings

2014 ◽  
Vol 53 (4) ◽  
pp. A383 ◽  
Author(s):  
Mathias Mende ◽  
Istvan Balasa ◽  
Henrik Ehlers ◽  
Detlev Ristau ◽  
Dam-be Douti ◽  
...  
Keyword(s):  
Optical Properties ◽  
Femtosecond Laser ◽  
Composite Coatings ◽  
Laser Damage ◽  
Damage Resistance

scholarly journals Surface treatment of CLBO crystal by ion beam and evaluation for ultraviolet laser damage resistance

2000 ◽  
Vol 120 (7) ◽  
pp. 945-949
Author(s):  
Tomosumi Kamimura ◽  
Kazuhito Nakai ◽  
Richi Ono ◽  
Yoshimura Masashi ◽  
Yusuke Mori ◽  
...  
Keyword(s):  
Surface Treatment ◽  
Ion Beam ◽  
Laser Damage ◽  
Damage Resistance ◽  
Ultraviolet Laser

Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

2007 ◽  
Vol 47 (13) ◽  
pp. C107 ◽  
Author(s):  
Laurent Gallais ◽  
Jérémie Capoulade ◽  
Jean-Yves Natoli ◽  
Mireille Commandré ◽  
Michel Cathelinaud ◽  
...  
Keyword(s):  
Low Voltage ◽  
Ion Beam ◽  
Laser Damage ◽  
Ion Beam Sputtering ◽  
Damage Resistance ◽  
Ion Plating ◽  
Electron Beam Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Beam Deposition

scholarly journals Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1226
Author(s):  
Wanli Zhang ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
Yongxiang Shen
Keyword(s):  
Chemical Etching ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Etching Depth ◽  
Treatment Processes ◽  
Laser Induced Damage ◽  
Combined Technique

The enhancement of laser damage resistance of fused silica optics was a hotspot in scientific research. At present, a variety of modern processes have been produced to improve the laser induced damage threshold (LIDT) of fused silica optics. They included pre-treatment processes represented by flexible computer controlled optical surfacing (CCOS), magnetorheological finishing (MRF), ion beam finishing (IBF), and post-treatment processes represented by dynamic chemical etching (DCE). These have achieved remarkable results. However, there are still some problems that need to be solved urgently, such as excessive material removal, surface accuracy fluctuation in the DCE process, and the pollution in MRF process, etc. In view of above problems, an MRF, CCOS, IBF and shallow DCE combined technique was used to process fused silica optics. The surface morphology could be greatly controlled and chemical etching depth was reduced, while the LIDT increased steadily. After processing by this combined technique, the LIDT increased to 12.1 J/cm2 and the laser damage resistance properties of fused silica were significantly enhanced. In general, the MRF, IBF, CCOS and shallow DCE combined technique brought much help to the enhancement of laser damage resistance of fused silica, and could be used as a process route in the manufacturing process of fused silica.

scholarly journals Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1294
Author(s):  
Yaoyu Zhong ◽  
Yifan Dai ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
...  
Keyword(s):  
Silica Surface ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Structural Defects ◽  
Laser Damage ◽  
Material Structure ◽  
Ion Beam Etching ◽  
Damage Resistance ◽  
Laser Induced Damage

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

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