Laser Damage Resistance of HfO^2 Thin Films Deposited by Electron Beam Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering

2007 ◽  
Author(s):  
Laurent Gallais ◽  
Jeremie Capoulade ◽  
Jean-Yves Natoli ◽  
Mireille Commandre ◽  
Michel Cathelinaud ◽  
...  
Keyword(s):  
Low Voltage ◽  
Ion Beam ◽  
Laser Damage ◽  
Ion Beam Sputtering ◽  
Damage Resistance ◽  
Ion Plating ◽  
Electron Beam Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Beam Deposition

Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

2007 ◽  
Vol 47 (13) ◽  
pp. C107 ◽  
Author(s):  
Laurent Gallais ◽  
Jérémie Capoulade ◽  
Jean-Yves Natoli ◽  
Mireille Commandré ◽  
Michel Cathelinaud ◽  
...  
Keyword(s):  
Low Voltage ◽  
Ion Beam ◽  
Laser Damage ◽  
Ion Beam Sputtering ◽  
Damage Resistance ◽  
Ion Plating ◽  
Electron Beam Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Beam Deposition

Effects of Nitrogen on Formation and Properties of Diamondlike Films Synthesized by Dual Ion Beam Deposition

1993 ◽  
Vol 316 ◽  
Author(s):  
Xiaoming He ◽  
Hongwei Song ◽  
Wenzhi Li ◽  
Fuzhai Cui ◽  
Hengde Li ◽  
...  
Keyword(s):  
Tungsten Carbide ◽  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Amorphous Structure ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Diamondlike Carbon ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Beam Deposition

ABSTRACTDiamondlike carbon-nitrogen films on silicon (111) wafer and tungsten carbide plates have been prepared by using dual ion beam sputtering deposition and simultaneous bombardment by N+ with energies of 100-800 eV at room temperature. These films retain their diamondlike characteristics. However, as the nitrogen content increases from 10% at to 20% at., the Auger electron spectroscopy spectra of films change obviously in fine structure and the main Cls peak of carbon atoms in the X-ray photoelectron spectroscopy spectra shifts to 285.65 eV. The maximum hardness of these films on tungsten carbide plates is about 5260 kg/mm2. The films have an amorphous structure and smooth surface. The state of nitrogen in films and its influence on the structure and properties of films are discussed.

scholarly journals Blue electroluminescence from Sb-ZnO/Cd-ZnO/Ga-ZnO heterojunction diode fabricated by dual ion beam sputtering

2014 ◽  
Vol 22 (25) ◽  
pp. 30983 ◽  
Author(s):  
Sushil Kumar Pandey ◽  
Vishnu Awasthi ◽  
Shruti Verma ◽  
Shaibal Mukherjee
Keyword(s):  
Ion Beam ◽  
Heterojunction Diode ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering
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