scholarly journals Large-area all-dielectric metasurface fabricated by anodized aluminum oxide template

2021 ◽  
Author(s):  
Bintao Du ◽  
Zhihai Wu ◽  
Jun Xia ◽  
jun wu ◽  
Guodong Tong ◽  
...  
2008 ◽  
Vol 22 (31n32) ◽  
pp. 5887-5894 ◽  
Author(s):  
HONG GUE SHIN ◽  
JONG TAE KWON ◽  
YOUNG HO SEO ◽  
BYEONG HEE KIM

A simple method for the fabrication of polymer master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index have usually been used. However, it is required to have a high cost and a long processing time for mass production. In this paper, antireflective surface was fabricated by using hot embossing process with porous anodized aluminum oxide. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Size and aspect ratio of nano patterned master are about 175 ± 25 nm and 2 ~ 3, respectively. In order to replicate nano patterned master, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master. Optical and rheological characteristics of antireflective surface were analyzed by using SEM, EDX and spectrometer inspection. Antireflective structure by replicating hot embossing process can be applied to various displays and automobile components.


2010 ◽  
Vol 20 (18) ◽  
pp. 3099-3105 ◽  
Author(s):  
David J. Comstock ◽  
Steven T. Christensen ◽  
Jeffrey W. Elam ◽  
Michael J. Pellin ◽  
Mark C. Hersam

2016 ◽  
Vol 12 (3) ◽  
pp. 575-580 ◽  
Author(s):  
Jeong Su Park ◽  
Dalnim Moon ◽  
Jin-Seok Kim ◽  
Jin Seok Lee

2016 ◽  
Vol 51 (7) ◽  
pp. 965-969 ◽  
Author(s):  
Daniel Choi ◽  
Boo Hyun An ◽  
Mariam Mansouri ◽  
Dima Ali ◽  
Malathe Khalil ◽  
...  

We have designed and demonstrated a complementary metal-oxide-semiconductor compatible process for fabricating high capacitance micro-capacitors based on vertically grown silver nanowires on silicon substrates. Array of silver nanowires with high-aspect ratio were electrochemically grown in the pores of anodized aluminum oxide film, which was pre-formed through anodization of aluminum thin film deposited on titanium/silicon oxide/silicon substrates. High dielectric bismuth ferric oxide layer was electrodeposited to fill the gap between silver nanowires after anodized aluminum oxide film was removed. It was found that the micro-capacitor based on the silver nanowires/bismuth ferric oxide composite film possessed higher capacitance by approximately one order of magnitude from the COMSOL simulation results from the flat Ag thin-film capacitor and the silver nanowire capacitor.


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