scholarly journals Demonstration of optical interference filters utilizing tunable refractive index layers

2010 ◽  
Vol 18 (S4) ◽  
pp. A594 ◽  
Author(s):  
David J. Poxson ◽  
Frank W. Mont ◽  
Martin F. Schubert ◽  
Jong Kyu Kim ◽  
Jaehee Cho ◽  
...  
Keyword(s):  
Refractive Index ◽  
Optical Interference ◽  
Interference Filters ◽  
Tunable Refractive Index

Optical Interference Filters By Sol-Gel Processing

1990 ◽  
Vol 180 ◽  
Author(s):  
J.L. Keddie ◽  
E.P. Giannelis
Keyword(s):  
Refractive Index ◽  
Rutherford Backscattering Spectrometry ◽  
Incident Light ◽  
Sol Gel ◽  
Theoretical Modeling ◽  
Optical Interference ◽  
Interference Filters ◽  
The Individual ◽  
Gel Processing ◽  
Good Agreement

ABSTRACTOptical interference filters have been synthesized by sol-gel. The selected filter is a multilayer of alternating TiO2 and SiO2 films. In transmission, the filter edge depends on the angle of incident light, which can be tailored through control of thickness and refractive index of the individual films. Theoretical modeling of the filter with film thicknesses obtained by Rutherford backscattering spectrometry is in good agreement with the experimental optical response.

Optical Interference Filters Made of Porous Silicon

1996 ◽  
Vol 431 ◽  
Author(s):  
M. Thönissen ◽  
M. G. Berger ◽  
M. Krüger ◽  
S. Billat ◽  
R. Arens-Fischer ◽  
...  
Keyword(s):  
Refractive Index ◽  
Porous Silicon ◽  
Current Density ◽  
Layer Structure ◽  
Single Layer ◽  
Bragg Reflectors ◽  
Optical Interference ◽  
Interference Filters ◽  
Thickness Measurements ◽  
Reflectance Measurements

AbstractPorous silicon (PS) layers can easily be formed by an electrochemical etch process using a mixture of hydrofluoric acid (HF) and ethanol. The microstructure and porosity of the layers depend on the HF concentration, the doping level of the substrate and the current density applied during the etch process. Changing the current density during the etch process will result in a well defined layer structure consisting of layers with different porosities. Each single layer can be treated as an effective medium exhibiting a refractive index depending mainly on the porosity of the layer. Using reflectance measurements we have investigated the dependence of the refractive index of PS layers on the formation current density for different substrates. In addition the etch rate was determined by thickness measurements with an electron microscope. Based on these results various kinds of optical interference filters were studied. We have formed samples consisting of discrete single layers with different porosities (e.g. Bragg reflectors) as well as samples with continuous variation of the refractive index (rugate filters). Combining these PS filters with standard photolithography steps, microoptical devices such as spectral sensitive photodiodes can be realized.

scholarly journals Trinary mappings: a tool for the determination of potential spectral paths for optical monitoring of optical interference filters

2018 ◽  
Vol 57 (24) ◽  
pp. 7012 ◽  
Author(s):  
Mael Vignaux ◽  
Fabien Lemarchand ◽  
Thomas Begou ◽  
Catherine Grèzes-Besset ◽  
Julien Lumeau
Keyword(s):  
Optical Monitoring ◽  
Optical Interference ◽  
Interference Filters

Fabrication of Al2O3/SiO2 multilayer reflective filters with excellent uniformity for demanding optical interference filters

2019 ◽  
Vol 6 (6) ◽  
pp. 066410 ◽  
Author(s):  
Vemuri SRS Praveen Kumar ◽  
Mukesh Kumar ◽  
Neelam Kumari ◽  
Vinod Karar ◽  
Amit L Sharma
Keyword(s):  
Optical Interference ◽  
Interference Filters
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