scholarly journals Beat the diffraction limit in 3D direct laser writing in photosensitive glass

2009 ◽  
Vol 17 (12) ◽  
pp. 10304 ◽  
Author(s):  
Matthieu Bellec ◽  
Arnaud Royon ◽  
Bruno Bousquet ◽  
Kevin Bourhis ◽  
Mona Treguer ◽  
...  
Keyword(s):  
Diffraction Limit ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Photosensitive Glass ◽  
Direct Laser

Direct laser writing of nonlinear properties in photosensitive glass

2011 ◽  
Author(s):  
Gautier Papon ◽  
Jiyeon Choi ◽  
Matthieu Bellec ◽  
Arnaud Royon ◽  
Kevin Bourhis ◽  
...  
Keyword(s):  
Direct Laser Writing ◽  
Laser Writing ◽  
Photosensitive Glass ◽  
Nonlinear Properties ◽  
Direct Laser

scholarly journals 3D Photonic Nanostructures via Diffusion-Assisted Direct fs Laser Writing

2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
Gabija Bickauskaite ◽  
Maria Manousidaki ◽  
Konstantina Terzaki ◽  
Elmina Kambouraki ◽  
Ioanna Sakellari ◽  
...  
Keyword(s):  
Electroless Plating ◽  
Metal Binding ◽  
Three Dimensional ◽  
Diffraction Limit ◽  
Metallic Surface ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Inorganic Hybrid ◽  
Direct Laser ◽  
Fs Laser

We present our research into the fabrication of fully three-dimensional metallic nanostructures using diffusion-assisted direct laser writing, a technique which employs quencher diffusion to fabricate structures with resolution beyond the diffraction limit. We have made dielectric 3D nanostructures by multiphoton polymerization using a metal-binding organic-inorganic hybrid material, and we covered them with silver using selective electroless plating. We have used this method to make spirals and woodpiles with 600 nm intralayer periodicity. The resulting photonic nanostructures have a smooth metallic surface and exhibit well-defined diffraction spectra, indicating good fabrication quality and internal periodicity. In addition, we have made dielectric woodpile structures decorated with gold nanoparticles. Our results show that diffusion-assisted direct laser writing and selective electroless plating can be combined to form a viable route for the fabrication of 3D dielectric and metallic photonic nanostructures.

scholarly journals Two-Photon Direct Laser Writing Beyond the Diffraction Limit Using the Nanopositioning and Nanomeasuring Machine

2021 ◽  
Author(s):  
Laura Mohr-Weidenfeller ◽  
Annika-Verena Häcker ◽  
Carsten Reinhardt ◽  
Eberhard Manske
Keyword(s):  
Numerical Aperture ◽  
Diffraction Limit ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Precise Positioning ◽  
Positioning Systems ◽  
Two Photon ◽  
Direct Laser ◽  
Near Future ◽  
Center Distance

AbstractSince the first realization of two-photon direct laser writing (DLW) in Maruo et al. (Opt Lett 22:132–134, 1997), the manufacturing using direct laser writing techniques spread out in many laboratories all over the world. Photosensitive materials with different material properties open a new field for micro- and nanofabrication. The achievable structuring resolution using this technique is reported to be sub-100 nm (Paz et al. in J. Laser Appl. 24:042004, 2012), while a smallest linewidth of 25 nm could be shown in Tan et al. (Appl Phys Lett 90:071106, 2007). In our approach, the combination of DLW with the nanopositioning and nanomeasuring machine NMM-1 offers an improvement of the technique from the engineering side regarding the ultra-precise positioning (Weidenfeller et al. in Adv Fabr Technol Micro/Nano Opt Photon XI 10544:105440E, 2018). One big benefit besides the high positioning resolution of 0.1 nm is offered by the positioning range of $$25\,\hbox {mm} \times 25\,\hbox {mm} \times 5\,\hbox {mm}$$ 25 mm × 25 mm × 5 mm (Jäger et al. in Technisches Messen 67:319–323, 2000; Manske et al. in Meas Sci Technol 18:520–527, 2007). Thus, a trans-scale fabrication without any stitching or combination of different positioning systems is necessary. The immense synergy between the highly precise positioning and the DLW is demonstrated by the realization of resist lines and trenches whose center-to-center distance undergoes the modified diffraction limit for two-photon processes. The precise positioning accuracy enables a defined distance between illuminated lines. Hence, with a comparable huge width of the trenches of $$1.655\,\upmu \hbox {m}$$ 1.655 μ m due to a low effective numerical aperture of 0.16, a resist line of 30 nm between two written trenches could be achieved. Although the interrelationships for achieving such narrow trenches have not yet been clarified, much smaller resist lines and trench widths are possible with this approach in the near future.

Super resolution direct laser writing in ITX resist inspired by STED microscopy

2014 ◽  
Vol 23 (02) ◽  
pp. 1450015 ◽  
Author(s):  
Chenyu Yuan ◽  
Jukun Liu ◽  
Tianqing Jia ◽  
Kan Zhou ◽  
Hongxin Zhang ◽  
...  
Keyword(s):  
Continuous Wave ◽  
Super Resolution ◽  
Diffraction Limit ◽  
Stimulated Emission ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Two Photon ◽  
Direct Laser ◽  
Fs Laser ◽  
532 Nm

Direct laser writing (DLW) has become a routine tool for fabricating microstructures through two photon polymerization. Due to the diffraction limit, the resolution is usually larger than a quarter of a wavelength. In this article, by using stimulated emission depletion (STED) inspired lithography, we fabricate nanodot of 81 nm in diameter and nanoline of 93 nm in width in resist with initiator of isopropyl thioxanthone (ITX). An 800 nm, 75-MHz fs laser works as the polymerization light and a 532 nm donut mode continuous wave (CW) laser as the depletion light. This technology is potentially useful for fabrication of super resolution nanostructures.

scholarly journals Large-scale high-numerical-aperture super-oscillatory lens fabricated by direct laser writing lithography

RSC Advances ◽  
2018 ◽  
Vol 8 (36) ◽  
pp. 20117-20123 ◽  
Author(s):  
Haibin Ni ◽  
Guanghui Yuan ◽  
Liangdong Sun ◽  
Ning Chang ◽  
Di Zhang ◽  
...  
Keyword(s):  
Large Scale ◽  
Numerical Aperture ◽  
Diffraction Limit ◽  
Far Field ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
High Numerical Aperture ◽  
Direct Laser

Super-oscillatory lens achieving sub-Abbe–Rayleigh diffraction limit focusing in the optical far-field were produced by direct laser writing (DLW) lithography method.

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