scholarly journals 3D Photonic Nanostructures via Diffusion-Assisted Direct fs Laser Writing

2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
Gabija Bickauskaite ◽  
Maria Manousidaki ◽  
Konstantina Terzaki ◽  
Elmina Kambouraki ◽  
Ioanna Sakellari ◽  
...  

We present our research into the fabrication of fully three-dimensional metallic nanostructures using diffusion-assisted direct laser writing, a technique which employs quencher diffusion to fabricate structures with resolution beyond the diffraction limit. We have made dielectric 3D nanostructures by multiphoton polymerization using a metal-binding organic-inorganic hybrid material, and we covered them with silver using selective electroless plating. We have used this method to make spirals and woodpiles with 600 nm intralayer periodicity. The resulting photonic nanostructures have a smooth metallic surface and exhibit well-defined diffraction spectra, indicating good fabrication quality and internal periodicity. In addition, we have made dielectric woodpile structures decorated with gold nanoparticles. Our results show that diffusion-assisted direct laser writing and selective electroless plating can be combined to form a viable route for the fabrication of 3D dielectric and metallic photonic nanostructures.

2014 ◽  
Vol 23 (02) ◽  
pp. 1450015 ◽  
Author(s):  
Chenyu Yuan ◽  
Jukun Liu ◽  
Tianqing Jia ◽  
Kan Zhou ◽  
Hongxin Zhang ◽  
...  

Direct laser writing (DLW) has become a routine tool for fabricating microstructures through two photon polymerization. Due to the diffraction limit, the resolution is usually larger than a quarter of a wavelength. In this article, by using stimulated emission depletion (STED) inspired lithography, we fabricate nanodot of 81 nm in diameter and nanoline of 93 nm in width in resist with initiator of isopropyl thioxanthone (ITX). An 800 nm, 75-MHz fs laser works as the polymerization light and a 532 nm donut mode continuous wave (CW) laser as the depletion light. This technology is potentially useful for fabrication of super resolution nanostructures.


CLEO: 2013 ◽  
2013 ◽  
Author(s):  
Jonathan Mueller ◽  
Joachim Fischer ◽  
Yatin Jadavji Mange ◽  
Thomas Nann ◽  
Martin Wegener

Materials ◽  
2020 ◽  
Vol 13 (22) ◽  
pp. 5279
Author(s):  
Stefan Belle ◽  
Babette Goetzendorfer ◽  
Ralf Hellmann

We report on the challenges in a hybrid sub-micrometer fabrication process while using three dimensional femtosecond direct laser writing and electroplating. With this hybrid subtractive and additive fabrication process, it is possible to generate metallic polarization elements with sub-wavelength dimensions of less than 400 nm in the cladding area. We show approaches for improving the adhesion of freestanding photoresist pillars as well as of the metallic cladding area, and we also demonstrate the avoidance of an inhibition layer and sticking of the freestanding pillars. Three-dimensional direct laser writing in a positive tone photoresist is used as a subtractive process to fabricate free-standing non-metallic photoresist pillars with an area of about 850 nm × 1400 nm, a height of 3000 nm, and a distance between the pillars of less than 400 nm. In a subsequent additive fabrication process, these channels are filled with gold by electrochemical deposition up to a final height of 2200 nm. Finally, the polarization elements are characterized by measuring the degree of polarization in order to show their behavior as quarter- and half-wave plates.


2004 ◽  
Vol 3 (7) ◽  
pp. 444-447 ◽  
Author(s):  
Markus Deubel ◽  
Georg von Freymann ◽  
Martin Wegener ◽  
Suresh Pereira ◽  
Kurt Busch ◽  
...  

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