Low loss high refractive index niobium oxide waveguide platform for visible light applications

Author(s):  
Kristof Lodewijks ◽  
Suseendran Jayachandran ◽  
Tangla David Kongnyuy ◽  
Silvia Lenci ◽  
Sayantan Das ◽  
...  
2016 ◽  
Vol 27 (11) ◽  
pp. 115303 ◽  
Author(s):  
Giuseppe Calafiore ◽  
Quentin Fillot ◽  
Scott Dhuey ◽  
Simone Sassolini ◽  
Filippo Salvadori ◽  
...  

2013 ◽  
Vol 102 (9) ◽  
pp. 091108 ◽  
Author(s):  
T. Campbell ◽  
A. P. Hibbins ◽  
J. R. Sambles ◽  
I. R. Hooper

Nanophotonics ◽  
2020 ◽  
Vol 9 (16) ◽  
pp. 4737-4742
Author(s):  
Anton A. Shubnic ◽  
Roman G. Polozkov ◽  
Ivan A. Shelykh ◽  
Ivan V. Iorsh

AbstractWe establish a simple quantitative criterium for the search of new dielectric materials with high values of refractive index in the visible range. It is demonstrated, that for light frequencies below the bandgap, the latter is determined by the dimensionless parameter η calculated as the ratio of the sum of the widths of conduction and valence bands and the bandgap. Small values of this parameter, which can be achieved in materials with almost flat bands, lead to dramatic increase of the refractive index. We illustrate this rule with a particular example of rhenium dichalcogenides, for which we perform ab initio calculations of the band structure and optical susceptibility and predict the values of the refractive index $n{ >}5$ in a wide frequency range around 1 eV together with comparatively low losses. Our findings open new perspectives in search for the new high-index/low-loss materials for all-dielectric nanophotonics.


Crystals ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 424
Author(s):  
Hanbin Lee ◽  
Minjeong Park ◽  
Minhyon Jeon ◽  
Byeongcheol Kim

The research on anti-reflection (AR) optical thin film has long sought to obtain high-performance reflection and transmission properties in photovoltaic and photonic devices. The study of multi-layer AR (M-AR) film with low- and high-refractive-index materials is essential to increase the selective transmittance and reflectance at visible light wavelengths. However, M-AR film exhibits low substrate adhesion and slow deposition rates. We developed a DC pulse sputter system incorporating an inductively coupled plasma (ICP) source of high density to obtain high-quality M-AR film. Six-layer AR optical thin film was simulated using SiOx as a low-refractive-index material and NbOx as a high-refractive-index material. The multi-layer AR film based on SiOx and NbOx (M-SiNb) was fabricated using DC pulse sputtering which incorporated an ICP source. M-SiNb film exhibited better properties than the optical simulation results at 550 nm (transmittance: 99.19%, reflectance: 0.87%). Similarly, the M-SiNb film fabricated using the ICP source had high transmittance and reflectance in the visible light region and excellent adhesion to the substrate notwithstanding the various mechanical tests it was subjected to. Consequently, the development of the DC pulse sputter system included the ICP source, and this study represents important research in the field of optical film.


2017 ◽  
Vol 7 (1) ◽  
Author(s):  
Carlos Pina-Hernandez ◽  
Alexander Koshelev ◽  
Scott Dhuey ◽  
Simone Sassolini ◽  
Michela Sainato ◽  
...  

2019 ◽  
Vol 125 (15) ◽  
pp. 151609 ◽  
Author(s):  
Doddoji Ramachari ◽  
Chan-Shan Yang ◽  
Osamu Wada ◽  
Takashi Uchino ◽  
Ci-Ling Pan

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