New approach to fabricate low-loss Titanium dioxide waveguides with electron beam lithography and atomic layer deposition

2013 ◽  
Author(s):  
Markus Häyrinen ◽  
Matthieu Roussey ◽  
Vishal Gandhi ◽  
Markku Kuittinen ◽  
Seppo Honkanen
Keyword(s):  
Titanium Dioxide ◽  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Electron Beam Lithography ◽  
Atomic Layer ◽  
Low Loss ◽  
New Approach ◽  
Layer Deposition

scholarly journals Low-loss titanium-dioxide strip waveguides by atomic layer deposition

2014 ◽  
Author(s):  
M. Roussey ◽  
M. Häyrinen ◽  
A. Säynätjoki ◽  
V. Gandhi ◽  
L. Karvonen ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Loss ◽  
Layer Deposition

Low-Loss Titanium Dioxide Strip Waveguides Fabricated by Atomic Layer Deposition

2014 ◽  
Vol 32 (2) ◽  
pp. 208-212 ◽  
Author(s):  
Markus Hayrinen ◽  
Matthieu Roussey ◽  
Vishal Gandhi ◽  
Petri Stenberg ◽  
Antti Saynatjoki ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Loss ◽  
Layer Deposition

Facile rearrangement of molecular layer deposited metalcone thin films by electron beam irradiation for area selective atomic layer deposition

2021 ◽  
Author(s):  
Seunghwan Lee ◽  
GeonHo Baek ◽  
Hye-mi Kim ◽  
Yong-Hwan Kim ◽  
Jin-Seong Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Electron Beam Irradiation ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Beam Irradiation ◽  
Selective Deposition ◽  
Layer Deposition ◽  
Amorphous Structures

Metalcone films can be rearranged from amorphous structures to 2D-like carbon by electron beam irradiation. The irradiated indicone (HQ) film can be used as an inhibitor for selective deposition delaying 20 cycles of ALD of ZnO.

Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide

2014 ◽  
Vol 26 (2) ◽  
pp. 024003 ◽  
Author(s):  
Stephan Ratzsch ◽  
Ernst-Bernhard Kley ◽  
Andreas Tünnermann ◽  
Adriana Szeghalmi
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Plasma Parameters ◽  
Layer Deposition

scholarly journals Novel Antimicrobial Titanium Dioxide Nanotubes Obtained through a Combination of Atomic Layer Deposition and Electrospinning Technologies

Nanomaterials ◽  
2018 ◽  
Vol 8 (2) ◽  
pp. 128 ◽  
Author(s):  
Carol López de Dicastillo ◽  
Cristian Patiño ◽  
María Galotto ◽  
Juan Palma ◽  
Daniela Alburquenque ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Titanium Dioxide Nanotubes ◽  
Layer Deposition

scholarly journals Dispersion Characteristics of α-Fe2O3 Nanopowders Coated with Titanium Dioxide by Atomic Layer Deposition

2017 ◽  
Vol 54 (2) ◽  
pp. 137-140 ◽  
Author(s):  
Hae Ryul Ok ◽  
Bo Kyung Lee ◽  
Hye Jin Bae ◽  
Hyug Jong Kim ◽  
Byung Ho Choi
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dispersion Characteristics ◽  
Layer Deposition

scholarly journals In situ XPS analysis of the atomic layer deposition of aluminium oxide on titanium dioxide

2019 ◽  
Vol 21 (3) ◽  
pp. 1393-1398 ◽  
Author(s):  
Robert H. Temperton ◽  
Andrew Gibson ◽  
James N. O'Shea
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Growth Process ◽  
Aluminium Oxide ◽  
Atomic Layer ◽  
Xps Analysis ◽  
Layer Deposition ◽  
Titanium Dioxide Surface ◽  
Rutile Titanium Dioxide

Ultra-thin aluminium oxide was grown on a rutile titanium dioxide surface by atomic layer deposition using trimethylaluminium and water precursors. XPS measurements were made during the growth process at near-ambient pressures.

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