High-Resolution Single-Shot Surface Shape and in-situ Measurements using Quadriwave Lateral Shearing Interferometry

2019 ◽  
Author(s):  
Sherazade Aknoun ◽  
Antoine Federici ◽  
Anaïs Saintoyant ◽  
William Boucher ◽  
Benoit Wattellier
Keyword(s):  
High Resolution ◽  
In Situ Measurements ◽  
Surface Shape ◽  
Single Shot ◽  
Shearing Interferometry ◽  
Lateral Shearing ◽  
Resolution Single ◽  
Lateral Shearing Interferometry

In Situ Stress Measurement of Ni Electrodeposition Using Lateral Shearing Interferometry

2020 ◽  
Vol 167 (16) ◽  
pp. 162504
Author(s):  
Jun Qiang ◽  
Kunjie Luo ◽  
Yanzhuo Dong ◽  
Bingyan Jiang ◽  
Dietmar Drummer ◽  
...  
Keyword(s):  
Stress Measurement ◽  
In Situ Stress ◽  
Shearing Interferometry ◽  
In Situ Stress Measurement ◽  
Lateral Shearing ◽  
Lateral Shearing Interferometry

High resolution, single shot emittance measurement of relativistic electrons from laser-driven accelerator

2011 ◽  
Author(s):  
G. G. Manahan ◽  
E. Brunetti ◽  
R. P. Shanks ◽  
M. R. Islam ◽  
B. Ersfeld ◽  
...  
Keyword(s):  
High Resolution ◽  
Relativistic Electrons ◽  
Single Shot ◽  
Resolution Single ◽  
Emittance Measurement

scholarly journals Understanding oxide degradation mechanisms in ultra-thin SiO2 through high-speed, high-resolution in-situ measurements

2005 ◽  
Vol 80 ◽  
pp. 182-185 ◽  
Author(s):  
S. Aresu ◽  
W. De Ceuninck ◽  
R. Degraeve ◽  
B. Kaczer ◽  
G. Knuyt ◽  
...  
Keyword(s):  
High Resolution ◽  
High Speed ◽  
In Situ Measurements ◽  
Degradation Mechanisms ◽  
Oxide Degradation

Study on Measurement of Thin Film Thickness with Lateral Shearing Interferometry

2013 ◽  
Vol 718-720 ◽  
pp. 848-852
Author(s):  
Jun Hong Su ◽  
Ying Shi ◽  
Jin Man Ge
Keyword(s):  
Film Thickness ◽  
Transform Method ◽  
Shearing Interferometry ◽  
Platform Process ◽  
Fast Fourier Transform Method ◽  
Lateral Shearing ◽  
Phase Unwrap ◽  
Technical Indicator ◽  
Lateral Shearing Interferometry ◽  
Shearing Interference

The film thickness is an important technical indicator of film devices, and its accuracy directly affects various performances of optical components. In fabrication process of film device, fast and accurate measurement of film thickness has positive significance on product quality control. In this paper, measure film thickness with lateral shearing interferometry. Collect interferograms through structured lateral shearing interference platform, process interferogram with Fast Fourier Transform method to extract phase, unwrap the wrapped phase to achieve phase value. Finally, calculate film thickness based on lateral shearing interference principle. The thickness of sample is 119.6800nm measured by this method, basically the same with the result 120.6036nm that measured by ZYGO interferometer. This experiment shows that lateral shearing interferometry not only suit to measurement of film thickness, but also abundant high-precision method of measuring film thickness, and has high practical value.

Real-Time Measurement of Atmospheric Coherence Length Based on Lateral Shearing Interferometry

2014 ◽  
Vol 41 (12) ◽  
pp. 1208006
Author(s):  
周健 Zhou Jian ◽  
孙建锋 Sun Jianfeng ◽  
鲁伟 Lu wei ◽  
马小平 Ma Xiaoping ◽  
刘立人 Liu Liren
Keyword(s):  
Real Time ◽  
Coherence Length ◽  
Time Measurement ◽  
Shearing Interferometry ◽  
Real Time Measurement ◽  
Lateral Shearing ◽  
Lateral Shearing Interferometry
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