High-resolution single-shot refractive index variation measurement using quadriwave lateral shearing interferometry (Conference Presentation)

2020 ◽  
Author(s):  
Antoine Federici ◽  
Sherazade Aknoun ◽  
William Boucher ◽  
Benoit Wattellier
Keyword(s):  
Refractive Index ◽  
High Resolution ◽  
Single Shot ◽  
Shearing Interferometry ◽  
Refractive Index Variation ◽  
Lateral Shearing ◽  
Index Variation ◽  
Resolution Single ◽  
Lateral Shearing Interferometry

High resolution, single shot emittance measurement of relativistic electrons from laser-driven accelerator

2011 ◽  
Author(s):  
G. G. Manahan ◽  
E. Brunetti ◽  
R. P. Shanks ◽  
M. R. Islam ◽  
B. Ersfeld ◽  
...  
Keyword(s):  
High Resolution ◽  
Relativistic Electrons ◽  
Single Shot ◽  
Resolution Single ◽  
Emittance Measurement

Study on Measurement of Thin Film Thickness with Lateral Shearing Interferometry

2013 ◽  
Vol 718-720 ◽  
pp. 848-852
Author(s):  
Jun Hong Su ◽  
Ying Shi ◽  
Jin Man Ge
Keyword(s):  
Film Thickness ◽  
Transform Method ◽  
Shearing Interferometry ◽  
Platform Process ◽  
Fast Fourier Transform Method ◽  
Lateral Shearing ◽  
Phase Unwrap ◽  
Technical Indicator ◽  
Lateral Shearing Interferometry ◽  
Shearing Interference

The film thickness is an important technical indicator of film devices, and its accuracy directly affects various performances of optical components. In fabrication process of film device, fast and accurate measurement of film thickness has positive significance on product quality control. In this paper, measure film thickness with lateral shearing interferometry. Collect interferograms through structured lateral shearing interference platform, process interferogram with Fast Fourier Transform method to extract phase, unwrap the wrapped phase to achieve phase value. Finally, calculate film thickness based on lateral shearing interference principle. The thickness of sample is 119.6800nm measured by this method, basically the same with the result 120.6036nm that measured by ZYGO interferometer. This experiment shows that lateral shearing interferometry not only suit to measurement of film thickness, but also abundant high-precision method of measuring film thickness, and has high practical value.

Spontaneous Recombination, Gain and Refractive Index Variation for 1.6 µm Wavelength InGaAsP/InP Lasers

1981 ◽  
Vol 20 (8) ◽  
pp. 1499-1505 ◽  
Author(s):  
Kristian Stubkjaer ◽  
Masahiro Asada ◽  
Shigehisa Arai ◽  
Yasuharu Suematsu
Keyword(s):  
Refractive Index ◽  
Refractive Index Variation ◽  
Spontaneous Recombination ◽  
Index Variation
Sign in / Sign up

Export Citation Format

Share Document