High-order wavefront correction with a spatial light modulator: calibrations with dOTF method

Author(s):  
Visa Korkiakoski ◽  
Christoph U. Keller ◽  
Niek Doelman ◽  
Johanan Codona ◽  
Matthew Kenworthy
2004 ◽  
Vol 12 (26) ◽  
pp. 6403 ◽  
Author(s):  
Lifa Hu ◽  
Li Xuan ◽  
Yongjun Liu ◽  
Zhaoliang Cao ◽  
Dayu Li ◽  
...  

2020 ◽  
Vol 10 (23) ◽  
pp. 8671
Author(s):  
Yoo Kwang Kim ◽  
Won Jong Ryu ◽  
Jin Su Lee

The non-periodic pinhole array filtering of a spatial light modulator (SLM) is proposed for filtering the high-order noise and DC noise of a holographic display. Conventionally, DC and high-order noise sources are filtered by a 4f filtering system. Because the 4f filtering system requires a long optical path length, noise filtering is a stumbling block when attempting to realize a compact holographic display. By contrast, the proposed method simply uses a thin filter fabricated by photolithography. In order to verify this concept, we confirmed the feasibility of the filter with a numerical simulation and with a custom-made non-periodic pinhole array filter used in a practical experiment. The proposed method was shown to have the potential to be used in applications ranging from compact wearable devices to table-top holographic displays.


2011 ◽  
Vol 121-126 ◽  
pp. 877-881
Author(s):  
Hong Xin Zhang ◽  
Xiao Xi Xu

Wavefront correction plays significant role in some fields like astronomical observation, laser processing and medical imaging, etc. Liquid crystal spatial light modulator ( LC SLM) is an ideal device for high-resolution wavefront correction because of its low cost, low consumption, large number of pixels and independent programming control of each unit. It is researched experimentally that LC SLM is used as a wavefront correction device and corrects arbitrary wavefront aberration. Wavefront correction is performed based on phase conjugation and periodic phase modulation with modulo-2π. The experimental results show that the PV value of the irregular wavefront aberration is 1.56λ, RMS value is 0.25 and Strehl ratio is 0.08 before correction, but the PV value of the residual aberration is reduced to 0.26λ, RMS value is 0.02 and Strehl ratio is increased to 0.97 which is approximated diffraction limit after correction. It is proved to be feasible and effective that LC SLM is used to the high-precision and high-resolution wavefront correction.


2020 ◽  
Vol 47 (9) ◽  
pp. 0905004
Author(s):  
刘奎 Liu Kui ◽  
李治 Li Zhi ◽  
郭辉 Guo Hui ◽  
郜江瑞 Gao Jiangrui

2017 ◽  
Vol 56 (9S) ◽  
pp. 09NC01 ◽  
Author(s):  
Mitsumasa Nakajima ◽  
Naru Nemoto ◽  
Keita Yamaguchi ◽  
Hiroshi Kudo ◽  
Joji Yamaguchi ◽  
...  

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
T. H. Lu ◽  
T. D. Huang ◽  
J. G. Wang ◽  
L. W. Wang ◽  
R. R. Alfano

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