Optimized condition for etching fused-silica phase gratings with inductively coupled plasma technology
Keyword(s):
2011 ◽
Vol 343-344
◽
pp. 769-773
2011 ◽
Vol 383-390
◽
pp. 790-795
2002 ◽
Vol 56
(9)
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pp. 1152-1160
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2015 ◽
Vol 341
◽
pp. 142-148
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1997 ◽
Vol 25
(5)
◽
pp. 1073-1080
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2017 ◽
Vol 6
(9)
◽
pp. P644-P652
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Keyword(s):
2016 ◽
Vol 704
◽
pp. 282-286
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