Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique

2020 ◽  
Vol 59 (5) ◽  
pp. A176
Author(s):  
Bo-Huei Liao ◽  
Chien-Nan Hsiao ◽  
Ming-Hua Shiao ◽  
Sheng-Hui Chen
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Silicon Oxynitride ◽  
Deposition Technique ◽  
Sputtering Deposition

Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN

2021 ◽  
pp. 138792
Author(s):  
K. Bobzin ◽  
T. Brögelmann ◽  
N.C. Kruppe ◽  
M. Engels ◽  
C. Schulze
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Substrate Bias ◽  
Sputtering Deposition ◽  
Pulsed Magnetron

Characterization of silicon oxynitride films deposited by HIPIMS deposition technique

2019 ◽  
Author(s):  
Bo-Huei Liao ◽  
Chien-Nan Hsiao ◽  
Ming-Hua Shiao ◽  
Shih-Hao Chan ◽  
Sheng-Hui Chen ◽  
...  
Keyword(s):  
Silicon Oxynitride ◽  
Deposition Technique

Reactive magnetron sputtering deposition and characterization of niobium carbide films

Vacuum ◽  
2014 ◽  
Vol 99 ◽  
pp. 233-241 ◽  
Author(s):  
Kan Zhang ◽  
M. Wen ◽  
G. Cheng ◽  
X. Li ◽  
Q.N. Meng ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Niobium Carbide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Sputtering Deposition

Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges

2014 ◽  
Vol 23 (6) ◽  
pp. 065043 ◽  
Author(s):  
P D Machura ◽  
A Hecimovic ◽  
S Gallian ◽  
J Winter ◽  
T de los Arcos
Keyword(s):  
Magnetic Fields ◽  
Magnetron Sputtering ◽  
High Power

Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system

2013 ◽  
Vol 549 ◽  
pp. 177-183 ◽  
Author(s):  
Martin Čada ◽  
Petr Adámek ◽  
Vítězslav Straňák ◽  
Štěpán Kment ◽  
Jiří Olejníček ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Ion Dynamics ◽  
Sputtering Deposition

Film characterization of titanium oxide films prepared by high-power impulse magnetron sputtering

2011 ◽  
Vol 206 (5) ◽  
pp. 967-971 ◽  
Author(s):  
F.J. Jing ◽  
K. Yukimura ◽  
H. Kato ◽  
Y.F. Lei ◽  
T.X. You ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
High Power ◽  
Oxide Films ◽  
Titanium Oxide Films
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