Entropy-based definition of laser beam spot size

1995 ◽  
Vol 34 (36) ◽  
pp. 8247 ◽  
Author(s):  
Miguel A. Porras ◽  
Rafael Medina
Keyword(s):  
Laser Beam ◽  
Spot Size ◽  
Beam Spot ◽  
Beam Spot Size ◽  
Definition Of

Effect of Excimer Laser Beam Spot Size on Carbon Laser-Produced Plasma Dynamics

2014 ◽  
Vol 42 (10) ◽  
pp. 2694-2695 ◽  
Author(s):  
Petru-Edward Nica ◽  
George B. Rusu ◽  
Oana-Georgiana Dragos ◽  
Cristian Ursu
Keyword(s):  
Laser Beam ◽  
Excimer Laser ◽  
Spot Size ◽  
Beam Spot ◽  
Plasma Dynamics ◽  
Beam Spot Size ◽  
Laser Produced Plasma

Higher-order CO_2 laser beam spot size and depth of focus determined

1981 ◽  
Vol 20 (11) ◽  
pp. 1933 ◽  
Author(s):  
James T. Luxon ◽  
David E. Parker
Keyword(s):  
Laser Beam ◽  
Spot Size ◽  
Higher Order ◽  
Depth Of Focus ◽  
Beam Spot ◽  
Beam Spot Size

Thermal lens measurements of optical computation of the laser beam spot size

1985 ◽  
Vol 57 (8) ◽  
pp. 1698-1703 ◽  
Author(s):  
K. L. Jansen ◽  
Joel M. Harris
Keyword(s):  
Laser Beam ◽  
Thermal Lens ◽  
Spot Size ◽  
Beam Spot ◽  
Beam Spot Size ◽  
Optical Computation

PLANAR JOSEPHSON JUNCTIONS FABRICATED BY FOCUSED-ION BEAM

2001 ◽  
Vol 15 (24n25) ◽  
pp. 3359-3360 ◽  
Author(s):  
Hye-Won Seo ◽  
Quark Y. Chen ◽  
Chong Wang ◽  
Wei-Kan Chu ◽  
T. M. Chuang ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Josephson Junctions ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Spot Size ◽  
Physical Significance ◽  
Fabrication Technique ◽  
Beam Spot ◽  
Beam Spot Size ◽  
Current Voltage

We have fabricated nano-scaled planar superconductor-insulator-superconductor Josephson junctions using focused ion beam (FIB) with beam spot size ~5 nm . To study the effectiveness of this fabrication technique and for the purpose of comparisons, a variety of samples have been made based on high temperature superconducting (HTS) YBa2Cu3O7-δ electrodes. The insulators are either vacuum or silicon dioxide. The samples showed current-voltage (IV) characteristics typical of a resistively shunted junction (RSJ). We will discuss various aspects of the processing methods and the physical significance of the junction characteristics.

Development of a high-current microbeam system

2014 ◽  
Vol 24 (03n04) ◽  
pp. 101-110 ◽  
Author(s):  
S. Matsuyama ◽  
K. Ishii ◽  
S. Suzuki ◽  
A. Terakawa ◽  
M. Fujiwara ◽  
...  
Keyword(s):  
Quadrupole Doublet ◽  
Spot Size ◽  
Beam Current ◽  
Chemical State ◽  
High Current ◽  
Rigid Support ◽  
Beam Spot ◽  
X Ray ◽  
Beam Spot Size

We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-[Formula: see text]-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of [Formula: see text] is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of [Formula: see text] with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of [Formula: see text]. The calculated spot size of the beam was [Formula: see text] and the measured spot size was [Formula: see text]. The WDX-[Formula: see text]-PIXE system with the microbeam system is now operational.

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