Multilayer-coated grating spectrometer operating in the extreme-ultraviolet region and based on the Seya–Namioka mount

1993 ◽  
Vol 32 (31) ◽  
pp. 6288 ◽  
Author(s):  
J. F. Seely ◽  
C. M. Brown
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Region ◽  
Grating Spectrometer

Effect of energetic electron and proton bombardment on the reflectance of silicon-carbide mirrors in the extreme-ultraviolet region

1994 ◽  
Vol 33 (25) ◽  
pp. 5902 ◽  
Author(s):  
G. E. Holland ◽  
J. F. Seely ◽  
R. P. McCoy ◽  
K. F. Dymond ◽  
C. Rollins ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Extreme Ultraviolet ◽  
Energetic Electron ◽  
Ultraviolet Region ◽  
Proton Bombardment

scholarly journals Phase-matched four-wave mixing in the extreme ultraviolet region

2018 ◽  
Vol 124 (1) ◽  
pp. 015901 ◽  
Author(s):  
Khoa Anh Tran ◽  
Khuong Ba Dinh ◽  
Peter Hannaford ◽  
Lap Van Dao
Keyword(s):  
Extreme Ultraviolet ◽  
Four Wave Mixing ◽  
Ultraviolet Region ◽  
Wave Mixing

Wave-Front Quality Analysis of Three-Dimension Pinhole Vector Diffractional in Extreme Ultraviolet Region

2010 ◽  
Vol 30 (10) ◽  
pp. 2849-2854 ◽  
Author(s):  
卢增雄 Lu Zengxiong ◽  
金春水 Jin Chunshui ◽  
张立超 Zhang Lichao ◽  
王丽萍 Wang Liping
Keyword(s):  
Wave Front ◽  
Extreme Ultraviolet ◽  
Quality Analysis ◽  
Ultraviolet Region ◽  
Three Dimension

Upgrade of beamline BL08B at Taiwan Light Source from a photon-BPM to a double-grating SGM beamline

2015 ◽  
Vol 22 (5) ◽  
pp. 1312-1318 ◽  
Author(s):  
Jih-Young Yuh ◽  
Shan-Wei Lin ◽  
Liang-Jen Huang ◽  
Hok-Sum Fung ◽  
Long-Life Lee ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Solar Physics ◽  
Emission Spectra ◽  
Ultraviolet Region ◽  
Extreme Ultraviolet Lithography ◽  
Beam Position ◽  
Ultraviolet Lithography ◽  
X Ray ◽  
Nano Fabrication ◽  
Grating Monochromator

During the last 20 years, beamline BL08B has been upgraded step by step from a photon beam-position monitor (BPM) to a testing beamline and a single-grating beamline that enables experiments to record X-ray photo-emission spectra (XPS) and X-ray absorption spectra (XAS) for research in solar physics, organic semiconductor materials and spinel oxides, with soft X-ray photon energies in the range 300–1000 eV. Demands for photon energy to extend to the extreme ultraviolet region for applications in nano-fabrication and topological thin films are increasing. The basic spherical-grating monochromator beamline was again upgraded by adding a second grating that delivers photons of energy from 80 to 420 eV. Four end-stations were designed for experiments with XPS, XAS, interstellar photoprocess systems (IPS) and extreme-ultraviolet lithography (EUVL) in the scheduled beam time. The data from these experiments show a large count rate in core levels probed and excellent statistics on background normalization in theL-edge adsorption spectrum.

Time-resolved ARPES Based on 8-fs High-harmonic Source in the Extreme Ultraviolet Region

2018 ◽  
Author(s):  
Kento Toume ◽  
Katsuya Oguri ◽  
Hiroki Mashiko ◽  
Keiko Kato ◽  
Yoshiaki Sekine ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
High Harmonic ◽  
Ultraviolet Region ◽  
Time Resolved ◽  
Harmonic Source

Mean-Life Measurements of Na V, Na VI and Na VII Levels in the Extreme Ultraviolet Region

1978 ◽  
Vol 18 (6) ◽  
pp. 496-498 ◽  
Author(s):  
J-P Buchet ◽  
M-C Buchet-Poulizac ◽  
M Druetta
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Region

High-throughput, high-damage-threshold broadband beam splitter for high-order harmonics in the extreme-ultraviolet region

2004 ◽  
Vol 29 (5) ◽  
pp. 507 ◽  
Author(s):  
Eiji J. Takahashi ◽  
Hirokazu Hasegawa ◽  
Yasuo Nabekawa ◽  
Katsumi Midorikawa
Keyword(s):  
High Throughput ◽  
Beam Splitter ◽  
Extreme Ultraviolet ◽  
Damage Threshold ◽  
High Order ◽  
Ultraviolet Region
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