Inelastic X-ray scattering and high-frequency dynamics of molecular liquids

2004 ◽  
Vol 76 (1) ◽  
pp. 79-89 ◽  
Author(s):  
E. Pontecorvo ◽  
R. Di Leonardo ◽  
C. Masciovecchio ◽  
G. Ruocco ◽  
B. Ruzicka ◽  
...  

The recently developed inelastic X-ray scattering technique opens a new kinematic region at the observation of molecular liquids vibrational dynamics over the lengthscales of the interparticle separation. We illustrate the capabilities of this powerful technique through the results obtained from liquid glycerol. A detailed analysis of the high-frequency vibrational dynamics of this system at ambient temperature is reported. New results in the study of structural relaxational dynamics in the high-temperature range (up to T = 560 K) are also discussed.

2018 ◽  
Vol 103 (1) ◽  
pp. 85-90 ◽  
Author(s):  
Takanori Sakairi ◽  
Tatsuya Sakamaki ◽  
Eiji Ohtani ◽  
Hiroshi Fukui ◽  
Seiji Kamada ◽  
...  

2001 ◽  
Vol 714 ◽  
Author(s):  
Kazuhiko Omote ◽  
Shigeru Kawamura

ABSTRACTWe have successively developed a new x-ray scattering technique for a non-destructive determination of pore-size distributions in porous low-κ thin films formed on thick substrates. The pore size distribution in a film is derived from x-ray diffuse scattering data, which are measured using offset θ/2θ scans to avoid strong specular reflections from the film surface and its substrate. Γ-distribution mode for the pores in the film is used in the calculation. The average diameter and the dispersion parameter of the Γ-distribution function are varied and refined by computer so that the calculated scattering pattern best matches to the experimental pattern. The technique has been used to analyze porous methyl silsesquioxane (MSQ) films. The pore size distributions determined by the x-ray scattering technique agree with that of the commonly used gas adsorption technique. The x-ray technique has been also used successfully determine small pores less than one nanometer in diameter, which is well below the lowest limit of the gas adsorption technique.


2010 ◽  
Vol 55 (27) ◽  
pp. 8302-8306 ◽  
Author(s):  
Toshihiro Kondo ◽  
Masayo Shibata ◽  
Naoko Hayashi ◽  
Hitoshi Fukumitsu ◽  
Takuya Masuda ◽  
...  

2004 ◽  
Vol 121 (5) ◽  
pp. 2376-2380 ◽  
Author(s):  
H. Kriegs ◽  
W. Steffen ◽  
G. Fytas ◽  
G. Monaco ◽  
C. Dreyfus ◽  
...  

2019 ◽  
Vol 351 (2-3) ◽  
pp. 190-196 ◽  
Author(s):  
Suguru Takahashi ◽  
Eiji Ohtani ◽  
Tatsuya Sakamaki ◽  
Seiji Kamada ◽  
Hiroshi Fukui ◽  
...  

1999 ◽  
Vol 562 ◽  
Author(s):  
G. Renaud ◽  
A. Barbier ◽  
C. Mocuta

ABSTRACTCombined in situ structural and ex situ magnetic studies of the Co/NiO(111) and Ni81Fe19/NiO(111) interfaces are presented. The Co and Permalloy films were grown on NiO(111) single crystals. Structural studies were performed by Grazing Incidence X-ray Scattering during growth. The effect of the temperature of the substrate during deposition was investigated. Under specific growth conditions, almost pure FCC Co and NiFe films can be obtained, with small quantities of twins. Magnetic measurements were performed ex situ by Magneto-Optical Kerr Effect (MOKE). A strong correlation between the magnetic properties and the crystallographic structure of the Co film is evidenced. High coercive fields are measured for all samples. High temperature annealing of the NiFe film leads to an improved crystalline quality, but the interface becomes reactive and diffuse: part of the Fe diffuses into the NiO substrate and forms an interface compound, likely to be the spinel NiFe2O4. We also report an in situ grazing incidence X-ray scattering study of the Ni/MgO(001) interface during its formation at room temperature. In-plane measurements reveal that the interface is sharp and that the epitaxial relationship is complex. Two distinct lattices are found to exist: expanded Ni(001) and Ni(110). The latter exhibits several orientations with respect to the substrate depending on the thickness. The Ni(110) orientations disappear by annealing at high temperature, leaving only the Ni cube/cube orientation. The layer was also almost fully transformed into NiO(001) by high temperature oxidation.


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