scholarly journals Studies on the Decrease of Dissolution Rate in Unexposed Areas of Chemically Amplified Three-Component Positive Resist by Means of Dissolution Inhibitors. I. The Decrease of Dissolution Rate in Unexposed Areas of Chemically Amplified Three-Component Positive Resist by Means of tert-Butyl Carbonate as a Dissolution Inhibitor.

1996 ◽  
Vol 53 (2) ◽  
pp. 133-141 ◽  
Author(s):  
Hideo HORIBE ◽  
Teruhiko KUMADA ◽  
Shigeru KUBOTA
Keyword(s):  
Dissolution Rate ◽  
Tert Butyl ◽  
Chemically Amplified ◽  
Positive Resist

Optimization of dissolution-rate characteristics of chemically amplified positive resist

1995 ◽  
Author(s):  
Toshiro Itani ◽  
Haruo Iwasaki ◽  
Hiroshi Yoshino ◽  
Masashi Fujimoto ◽  
Kunihiko Kasama
Keyword(s):  
Dissolution Rate ◽  
Chemically Amplified ◽  
Positive Resist

Relationship between Dissolution Inhibitors and Dissolution Rate of Resist in Chemically Amplified Three-Component Positive Resist

1995 ◽  
Vol 34 (Part 1, No. 8A) ◽  
pp. 4247-4252 ◽  
Author(s):  
Hideo Horibe ◽  
Teruhiko Kumada ◽  
Shigeru Kubota ◽  
Yoshika Kimura
Keyword(s):  
Dissolution Rate ◽  
Chemically Amplified ◽  
Positive Resist

Dissolution rate modeling of a chemically amplified positive resist

1993 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Allen G. Timko ◽  
Omkaram Nalamasu ◽  
Douglas R. Stone
Keyword(s):  
Dissolution Rate ◽  
Chemically Amplified ◽  
Positive Resist

Performance of a chemically amplified positive resist for next-generation photomask fabrication

1998 ◽  
Author(s):  
Masa-aki Kurihara ◽  
Toshikazu Segawa ◽  
Daichi Okuno ◽  
Naoya Hayashi ◽  
Hisatake Sano
Keyword(s):  
Next Generation ◽  
Chemically Amplified ◽  
Positive Resist

Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold-making as studied by dissolution rate monitor

2006 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Kazuto Oono ◽  
Yoshiyuki Negishi ◽  
Daisuke Inokuchi ◽  
Keishi Tanaka ◽  
...  
Keyword(s):  
Dissolution Rate ◽  
Dissolution Behavior ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mold Making

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

1996 ◽  
Author(s):  
Yasunobu Onishi ◽  
Kazuo Sato ◽  
Kenzi Chiba ◽  
Masafumi Asano ◽  
Hirokazu Niki ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

Electron-beam lithography of isolated trenches with chemically amplified positive resist

2002 ◽  
Author(s):  
Andrew R. Eckert ◽  
Richard J. Bojko ◽  
Harold Gentile ◽  
Robert Harris ◽  
Jay Jayashankar ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Positive Resist
Sign in / Sign up

Export Citation Format

Share Document