Synthesis and Characterization of Nanocrystalline Zno Thin Film Prepared By Atomic Layer Deposition

2018 ◽  
pp. 37-48
Author(s):  
T. V. Lidiya ◽  
K. Rajeev Kumar
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Synthesis And Characterization ◽  
Zno Thin Film ◽  
Layer Deposition

Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition

2020 ◽  
Vol 49 (14) ◽  
pp. 4306-4314
Author(s):  
Seong Ho Han ◽  
Raphael Edem Agbenyeke ◽  
Ga Yeon Lee ◽  
Bo Keun Park ◽  
Chang Gyoun Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atomic Layer ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Zno Thin Films ◽  
Synthesis And Characterization ◽  
Zno Thin Film ◽  
Layer Deposition

Novel zinc precursors were designed, synthesized and used for the deposition of ZnO thin films by ALD.

Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

2017 ◽  
Vol 46 (4) ◽  
pp. 1172-1178 ◽  
Author(s):  
T. Jurca ◽  
A. W. Peters ◽  
A. R. Mouat ◽  
O. K. Farha ◽  
J. T. Hupp ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Second Generation ◽  
Atomic Layer ◽  
Synthesis And Characterization ◽  
Layer Deposition

The synthesis and characterization of molybdenum oxo-amidinate ALD precursors MoO2(R2AMD)2[AMD =N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) andiPr (3)] is reported.

High-performance ZnO thin-film transistor fabricated by atomic layer deposition

2011 ◽  
Vol 26 (8) ◽  
pp. 085007 ◽  
Author(s):  
Byeong-Yun Oh ◽  
Young-Hwan Kim ◽  
Hee-Jun Lee ◽  
Byoung-Yong Kim ◽  
Hong-Gyu Park ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Thin Film Transistor ◽  
Atomic Layer ◽  
Zno Thin Film ◽  
Layer Deposition

36.3: Flexible ZnO Thin‐Film Transistors Fabricated on PEN Substrate by Atomic Layer Deposition at Low Temperature

2021 ◽  
Vol 52 (S2) ◽  
pp. 472-476
Author(s):  
Qi Li ◽  
Huijin Li ◽  
Junchen Dong ◽  
Jingyi Wang ◽  
Dedong Han ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thin Film Transistors ◽  
Atomic Layer ◽  
Zno Thin Film ◽  
Layer Deposition

Characterization of Ru thin-film conductivity upon atomic layer deposition on H-passivated Si(111)

2012 ◽  
Vol 112 (11) ◽  
pp. 113517 ◽  
Author(s):  
K. Roodenko ◽  
S. K. Park ◽  
J. Kwon ◽  
L. Wielunski ◽  
Y. J. Chabal
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Film Conductivity
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