scholarly journals Thin Film Depth Profiling

2014 ◽  
pp. 220-243 ◽  
Keyword(s):  
Author(s):  
Wentao Qin ◽  
Dorai Iyer ◽  
Jim Morgan ◽  
Carroll Casteel ◽  
Robert Watkins ◽  
...  

Abstract Ni(5 at.%Pt ) films were silicided at a temperature below 400 °C and at 550 °C. The two silicidation temperatures had produced different responses to the subsequent metal etch. Catastrophic removal of the silicide was seen with the low silicidation temperature, while the desired etch selectivity was achieved with the high silicidation temperature. The surface microstructures developed were characterized with TEM and Auger depth profiling. The data correlate with both silicidation temperatures and ultimately the difference in the response to the metal etch. With the high silicidation temperature, there existed a thin Si-oxide film that was close to the surface and embedded with particles which contain metals. This thin film is expected to contribute significantly to the desired etch selectivity. The formation of this layer is interpreted thermodynamically.


2021 ◽  
Vol 27 (S1) ◽  
pp. 1564-1565
Author(s):  
Vincent Smentkowski ◽  
Shubhodeep Goswami ◽  
Felix Kollmer ◽  
Julia Zakel ◽  
Henrik Arlinghaus ◽  
...  
Keyword(s):  

2000 ◽  
Vol 162-163 ◽  
pp. 630-637 ◽  
Author(s):  
Y. Fan ◽  
A.G. Fitzgerald ◽  
J.A. Cairns ◽  
P. John ◽  
C.E. Troupe ◽  
...  
Keyword(s):  

2013 ◽  
Vol 45 (13) ◽  
pp. 1811-1820 ◽  
Author(s):  
Axel Eicke ◽  
Thomas Ciba ◽  
Dimitrios Hariskos ◽  
Richard Menner ◽  
Carsten Tschamber ◽  
...  

1991 ◽  
Vol 232 ◽  
Author(s):  
Cherngye Hwang ◽  
Michael A. Parker ◽  
J. Kent Howard

ABSTRACTThe antiferromagnctic FeMn thin film has been used to stabilize the domains in NiFe films by exchange-coupling, thus eliminating the Barkhauscn noise in magnetoresistive sensor designs. T'he strength of this exchange-coupling is highly dependent on the interfacial structure, as well as the interfacial composition of this NiFe/FeMn thin film couple. We have conducted isothermal, as well as isochronal anneals of NiFe/FeMn thin film couples, and monitored their magnetic properties, in particular the strength of their exchange-coupling. The strength of exchange-coupling, measured by the shift of the B-H loop obtained from a hysteresis loop tracer, increased monotonically with annealing time for isothermal anneals between 200 and 300 °C. At higher temperatures (up to 500°C), the interdiffusion between the two layers is so extensive that the NiFe layer loses its sort-magnetic properties and the coupling strength is degraded. Composition depth-profiling by scanning Auger analysis was conducted to study the interdiffusion profiles of the annealed samples. Cross-section transmission electron microscopy (XTEM) was used to study the microstructure, crystallography, and composition of these thin films after annealing. Micro-beam composition analysis was also carried out and the compositional profile obtained was compared to the Auger depth-profile results. Transmitted electron diffraction using selected area electron diffraction (SAED) and elongated probe micro-diffraction (EPMD) of XTEM samples was used to study the crystallography of these films.


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