Electronic states and electrical properties of nanoscale materials

2009 ◽  
pp. 63-123
Keyword(s):  
Electrical Properties ◽  
Electronic States ◽  
Nanoscale Materials

Electrical Properties and Electronic States of Molecular Conductors Based on Unsymmetrical Organometallic-Dithiolene Gold(III) Complexes

2008 ◽  
Vol 47 (12) ◽  
pp. 5495-5502 ◽  
Author(s):  
Kazuya Kubo ◽  
Akiko Nakao ◽  
Yasuyuki Ishii ◽  
Takashi Yamamoto ◽  
Masafumi Tamura ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Electronic States ◽  
Molecular Conductors

Electrical Properties of Clustered and Precipitated Iron in Silicon

2005 ◽  
Vol 108-109 ◽  
pp. 109-114
Author(s):  
R. Khalil ◽  
Vitaly V. Kveder ◽  
Wolfgang Schröter ◽  
Michael Seibt
Keyword(s):  
Electrical Properties ◽  
Deep Level Transient Spectroscopy ◽  
Deep Level ◽  
Iron Silicide ◽  
Electronic States ◽  
Moderate Temperature ◽  
Extended Defects ◽  
Characteristic Features ◽  
Transient Spectroscopy ◽  
The Stability

Deep electronic states associated with iron silicide precipitates have been studied by means of deep-level transient spectroscopy. The observed spectra show the characteristic features of bandlike states at extended defects. From the stability of the states on annealing at moderate temperature they are tentatively attributed to precipitate-matrix interfaces.

CORRELATION BETWEEN ATOMIC-SCALE STRUCTURES AND MACROSCOPIC ELECTRICAL PROPERTIES OF METAL-COVERED Si(111) SURFACES

1993 ◽  
Vol 07 (22) ◽  
pp. 3817-3876 ◽  
Author(s):  
SHUJI HASEGAWA ◽  
SHOZO INO
Keyword(s):  
Electrical Properties ◽  
Electronic States ◽  
High Energy ◽  
Schottky Barriers ◽  
Atomic Scale ◽  
Scanning Tunneling ◽  
Surface Conductance ◽  
Tunneling Microscopy ◽  
Band Bending ◽  
Scale Structures

In this review, we discuss the relation between the atomic-scale structures (atomic arrangements and electronic states) and the macroscopic electrical properties (surface conductance and Schottky barriers) of metal(Ag, Au, or In)-covered Si (111) surfaces. These surfaces have been one of the most intensively investigated systems with the use of a variety of modern surface science techniques, and diversified information at atomic scales has been obtained. The data of reflection high-energy electron diffraction, scanning tunneling microscopy/spectroscopy, photoemission spectroscopies, and others are utilized here for characterizing the structures. Surface conductance and Schottky barriers, on the other hand, have also been the major areas in semiconductor physics for, especially device-oriented, research, but these have rarely been studied in combination with atomic-scale structures. These electrical properties have recently been found to be crucially dependent on the local atomic structures of well-defined surfaces/interfaces. The atomic arrangements and the resulting surface/interface electronic states govern the Fermi-level pinning and band bending which determine the electrical properties of semiconductor surfaces/interfaces.

scholarly journals Investigation of Electronic Structure of Zr1-xVxNiSn Semiconductive Solid Solution

2019 ◽  
Vol 20 (2) ◽  
pp. 127-132
Author(s):  
Yu.V. Stadnyk ◽  
V.V. Romaka ◽  
V.A. Romaka ◽  
A.M. Нoryn ◽  
L.P. Romaka ◽  
...  
Keyword(s):  
Solid Solution ◽  
Electronic Structure ◽  
Electrical Properties ◽  
Band Gap ◽  
Electronic States ◽  
Structural Defects ◽  
Simultaneous Generation ◽  
Density Of Electronic States ◽  
Donor And Acceptor ◽  
Donor Acceptor

The peculiarities of electronic and crystal structures of Zr1-xVxNiSn (x = 0 - 0.10) semiconductive solid solution were investigated. To predict Fermi level εF behavior, band gap εg and electrokinetic characteristics of Zr1-xVxNiSn, the distribution of density of electronic states (DOS) was calculated. The mechanism of simultaneous generation of structural defects of donor and acceptor nature was determined based on the results of calculations of electronic structure and measurement of electrical properties of Zr1-xVxNiSn semiconductive solid solution. It was established that in the band gap of Zr1-xVxNiSn the energy states of the impurity donor εD2 and acceptor εA1 levels (donor-acceptor pairs) appear, which determine the mechanisms of conduction of semiconductor.

Effect of MnO on the Electrical Properties of Nb-Doped SrTiO3 Varistor

1998 ◽  
Vol 547 ◽  
Author(s):  
S.-H. Kim ◽  
H.-W. Seon ◽  
Yoonho Kim
Keyword(s):  
Electrical Properties ◽  
Grain Boundaries ◽  
Electronic States ◽  
Potential Barrier Height ◽  
Plane Analysis ◽  
Current Voltage ◽  
Capacitance Voltage ◽  
Electrode Method ◽  
Single Grain ◽  
Mn Doped

AbstractThe effect of MnO on the electrical properties of Nb-doped SrTiO3 was investigated to understand the electronic states of grains and grain boundaries. Grain size and dielectric constant were decreased with increasing Mn-doped content from 0 to 0.07 mol%. However, it was observed that the non-linearity coefficient of Nb-doped SrTiO3 was changed from 5 to 43 with Mn-doped content increasing from 0 to 0.03 mol%. Current-voltage (I-V) characteristics, capacitance-voltage (C-V) measurement, complex plane analysis and impedance spectroscopy were performed to obtain the information about the electrical properties of grains and grain boundaries. The potential barrier height increased and the donor concentration decreased with increasing Mn-doped content. This phenomena, that the electrical properties of Nb-doped SrTiO3 were changed with the addition of Mn, would be determined by the effect which Mn-2-3 substituted for Ti sites. It was observed that the breakdown voltage of single grain boundary was changed from 3.8 V to 8.9 V when measured by micro-electrode method.

scholarly journals The Electronic States of Some Metal Impurities in Germanium

1982 ◽  
Vol 35 (1) ◽  
pp. 53 ◽  
Author(s):  
SJ Pearton
Keyword(s):  
Electrical Properties ◽  
Cross Sections ◽  
Energy Levels ◽  
Electronic States ◽  
Capture Cross ◽  
Deep Impurity ◽  
Impurity States ◽  
Metal Impurities ◽  
Capacitance Spectroscopy ◽  
Capture Cross Sections

Capacitance spectroscopy measurements of the energy levels and majority carrier capture cross sections of deep impurity states associated with S, Zn, Pb and Bi in Ge are presented. Similarities in the electrical properties of these elements with other deep impurities in Ge are discussed.

In situ TEM measurements of the electrical properties of interface dislocations

1992 ◽  
Vol 50 (2) ◽  
pp. 1338-1339
Author(s):  
F. M. Ross ◽  
R. Hull ◽  
D. Bahnck ◽  
J. C. Bean ◽  
L. J. Peticolas ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Electronic Device ◽  
In Situ Tem ◽  
Device Performance ◽  
Misfit Dislocations ◽  
Electrical Characteristics ◽  
Strained Layer ◽  
Transmission Electron ◽  
Interfacial Dislocations

We describe an investigation of the electrical properties of interfacial dislocations in strained layer heterostructures. We have been measuring both the structural and electrical characteristics of strained layer p-n junction diodes simultaneously in a transmission electron microscope, enabling us to correlate changes in the electrical characteristics of a device with the formation of dislocations.The presence of dislocations within an electronic device is known to degrade the device performance. This degradation is of increasing significance in the design and processing of novel strained layer devices which may require layer thicknesses above the critical thickness (hc), where it is energetically favourable for the layers to relax by the formation of misfit dislocations at the strained interfaces. In order to quantify how device performance is affected when relaxation occurs we have therefore been investigating the electrical properties of dislocations at the p-n junction in Si/GeSi diodes.

The morphologies and electrical properties of indium contacts on (100) cadmium telluride surfaces

1992 ◽  
Vol 50 (2) ◽  
pp. 1422-1423
Author(s):  
A.M. Letsoalo ◽  
M.E. Lee ◽  
E.O. de Neijs
Keyword(s):  
Electrical Properties ◽  
Cadmium Telluride ◽  
Methanol Solution ◽  
Electrical Characteristics ◽  
Metal Contacts ◽  
Deposition Technique ◽  
Interfacial Layers ◽  
Semiconductor Contacts ◽  
Grown Single Crystal ◽  
Diamond Abrasive

Semiconductor devices require metal contacts for efficient collection of electrical charge. The physics of these metal/semiconductor contacts assumes perfect, abrupt and continuous interfaces between the layers. However, in practice these layers are neither continuous nor abrupt due to poor nucleation conditions and the formation of interfacial layers. The effects of layer thickness, deposition rate and substrate stoichiometry have been previously reported. In this work we will compare the effects of a single deposition technique and multiple depositions on the morphology of indium layers grown on (100) CdTe substrates. The electrical characteristics and specific resistivities of the indium contacts were measured, and their relationships with indium layer morphologies were established.Semi-insulating (100) CdTe samples were cut from Bridgman grown single crystal ingots. The surface of the as-cut slices were mechanically polished using 5μm, 3μm, 1μm and 0,25μm diamond abrasive respectively. This was followed by two minutes immersion in a 5% bromine-methanol solution.

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