Surface Patterning, Drilling, and Cutting

2013 ◽  
pp. 243-280 ◽  
Keyword(s):  
Surface Patterning

scholarly journals Sonolithography: In‐Air Ultrasonic Particulate and Droplet Manipulation for Multiscale Surface Patterning

2020 ◽  
pp. 2000689
Author(s):  
Jenna M. Shapiro ◽  
Bruce W. Drinkwater ◽  
Adam W. Perriman ◽  
Mike Fraser
Keyword(s):  
Surface Patterning ◽  
Droplet Manipulation

Impact of back surface patterning process on FF in IBC-SHJ

2012 ◽  
Author(s):  
Lulu Zhang ◽  
Brent Shu ◽  
Robert Birkmire ◽  
Steve Hegedus ◽  
Ujjwal Das
Keyword(s):  
Surface Patterning ◽  
Back Surface

Robust Method for High-Throughput Surface Patterning of Deformable Substrates

Langmuir ◽  
2011 ◽  
Vol 27 (12) ◽  
pp. 7349-7352 ◽  
Author(s):  
Ammar Azioune ◽  
Nicolas Carpi ◽  
Jenny Fink ◽  
Mohamed M. Chehimi ◽  
Damien Cuvelier ◽  
...  
Keyword(s):  
High Throughput ◽  
Surface Patterning ◽  
Robust Method

Bacterial anti-adhesion surface design: surface patterning, roughness and wettability: A review

2021 ◽  
Author(s):  
Kun Yang ◽  
Jirong Shi ◽  
Lei Wang ◽  
Yingzhi Chen ◽  
Chunyong Liang ◽  
...  
Keyword(s):  
Surface Patterning ◽  
Surface Design

scholarly journals Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 910 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Integrated Circuits ◽  
Large Scale ◽  
Photonic Integrated Circuits ◽  
Surface Patterning ◽  
Propagation Loss ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Low Loss ◽  
Atomic Force

In this paper, we develop a technique for realizing multi-centimeter-long lithium niobate on insulator (LNOI) waveguides with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides was determined with an atomic force microscope to be 0.452 nm. The approach is compatible with other surface patterning technologies, such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.

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