Luminescence Studies of Impurities and Defects in III-Nitride Semiconductors

2015 ◽  
Vol 30 (20) ◽  
pp. 2977-2990 ◽  
Author(s):  
Ingo Tischer ◽  
Matthias Hocker ◽  
Benjamin Neuschl ◽  
Manfred Madel ◽  
Martin Feneberg ◽  
...  

Abstract


2013 ◽  
Vol 26 (5) ◽  
pp. 805-809 ◽  
Author(s):  
Guigang Zhang ◽  
Mingwen Zhang ◽  
Xinxin Ye ◽  
Xiaoqing Qiu ◽  
Sen Lin ◽  
...  

2017 ◽  
Vol 23 (50) ◽  
pp. 12275-12282 ◽  
Author(s):  
Jonas Häusler ◽  
Saskia Schimmel ◽  
Peter Wellmann ◽  
Wolfgang Schnick

1993 ◽  
Vol 74 (8) ◽  
pp. 4936-4942 ◽  
Author(s):  
F. Priolo ◽  
S. Coffa ◽  
G. Franzò ◽  
C. Spinella ◽  
A. Carnera ◽  
...  

1993 ◽  
Vol 301 ◽  
Author(s):  
S. Uekusa ◽  
A. Majima ◽  
H. Katsumata ◽  
Y. Noyori ◽  
M. Kumagai

ABSTRACTFor the evaluation of an implanted layer, photoluminescence (PL) and photoluminescence excitation (PLE) measurements, which are nondestructive and sensitive methods for identifying impurities and defects, were performed. Yb3+ -related sharp luminescence was observed at a wavelength of 1002nm, due to the transitions which occurred between the spin-orbit levels 2F5/2→2F7/2 of Yb3+ (4f13). Most efficient luminescence of Yb3+ was achieved at an excitation wavelength of around 880nm. The luminescence intensity of this peak (Yb3+) decreased with an increase in annealing temperature. Since the peak has not been observed for good samples in crystallinity, it may indicate that new, efficient energy transfer processes to rare-earth ions occur through the defect energy level. Especially, for the sample annealed at 600°C, Yb-related luminescence intensity excited by the photon energy below the band gap is about 3 times larger than that of excited by the photon energy above the band gap.


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