Three dimensional traveltime computation using the fast marching method

1997 ◽  
Author(s):  
Alexander Mihai Popovici ◽  
James Sethian
Keyword(s):  
Three Dimensional ◽  
Fast Marching Method ◽  
Fast Marching ◽  
Marching Method

Simulations and Analysis of the Moving Mask UV Lithography for Thick-Photoresist

2013 ◽  
Vol 455 ◽  
pp. 88-93
Author(s):  
Qian Yu ◽  
Zai Fa Zhou ◽  
Heng Zhang
Keyword(s):  
Energy Deposition ◽  
Uv Light ◽  
Three Dimensional ◽  
Simulation System ◽  
Development Model ◽  
Fast Marching Method ◽  
Fast Marching ◽  
Uv Lithography ◽  
Thick Photoresist ◽  
Marching Method

A three-dimensional (3D) simulation system is developed for the moving mask UV lithography of thick photoresist. The exposure simulation model is obtained with consideration of the mask moving function, the refraction and energy loss of the UV light at the surface of photoresist, and the reflection at the photoresist/substrate interface. The development model is calculated by the fast marching method. In addition, the energy deposition distributions and the three-dimensional development profiles are presented under different conditions to study the effect of various parameters and to verify the accuracy by experiment. The results will be useful to understand the effects and to control the exposure conditions in the design process of moving mask UV lithography for thick-photoresist in the future.

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