Analysis of Barrier Layer Thickness on Performance of In1–xGaxAs Based Gate Stack Cylindrical Gate Nanowire MOSFET
2018 ◽
Vol 13
(10)
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pp. 1473-1477
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Keyword(s):
In this paper, InGaAs/InP heterostructure based Cylindrical Gate Nanowire MOSFETs (CGNWMOSFET) is designed and its performance has been analyzed using silvaco ATLAS TCAD tool. The influence of the barrier thickness is investigated for perusal performance of an InGaAs/InP heterostructure CGNWMOSFET. The performance compared for various parameters on current, off current, Cut off Frequency (fT), Transconductance (gm), Gate to Source capacitance (Cgs), and Gate to Drain capacitance (Cgd). Results show significant variation in the performance of InGaAs/InP heterostructure CGNWMOSFET by varying the barrier thickness.
2014 ◽
Vol 119
(2)
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pp. 805-823
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2000 ◽
pp. 993-995
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2016 ◽
Vol 120
(37)
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pp. 20922-20928
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2012 ◽
Vol 33
(13)
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pp. 2855-2870
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Keyword(s):
1955 ◽
Vol 102
(6)
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pp. 357
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Keyword(s):
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1954 ◽
Vol 101
(9)
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pp. 481
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Keyword(s):