Current Transport Mechanisms in N-Type Ultrananocrystalline Diamond/P-Type Si Heterojunctions

2016 ◽  
Vol 16 (12) ◽  
pp. 12749-12753 ◽  
Author(s):  
Abdelrahman Zkria ◽  
Mahmoud Shaban ◽  
Takanori Hanada ◽  
Nathaporn Promros ◽  
Tsuyoshi Yoshitake
1999 ◽  
Vol 570 ◽  
Author(s):  
Vo Van Tuyen

The realization of Planar Doped Barrier Diode (PDBD) presented in this paper starts out from the limits of the MBE layer growth technology. The limitations due to the background doping concentration and the diffusion of the n and p type dopants during the epitaxial growth are considered. The next parameter is the height of the potential barrier. The choice of this value depends on the requirements of the application. It must take into consideration the current transport mechanisms and the current limitation appearing at higher bias levels.


2010 ◽  
Vol 504 (1) ◽  
pp. 146-150 ◽  
Author(s):  
V. Janardhanam ◽  
Hoon-Ki Lee ◽  
Kyu-Hwan Shim ◽  
Hyo-Bong Hong ◽  
Soo-Hyung Lee ◽  
...  

2015 ◽  
Vol 38 (3) ◽  
pp. 725-729 ◽  
Author(s):  
PAN RUIKUN ◽  
LIU PANKE ◽  
LI MINGKAI ◽  
TAO HAIZHENG ◽  
LI PAI ◽  
...  

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