Crystallization Process of Silicon Thin Films with Carbon Nanotube Electron Beam (C-Beam)

2016 ◽  
Vol 16 (11) ◽  
pp. 11788-11792 ◽  
Author(s):  
Jung Su Kang ◽  
Su Woong Lee ◽  
Shikili Callixte ◽  
Won Jong Kim ◽  
Kyu Chang Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Carbon Nanotube ◽  
Crystallization Process ◽  
Silicon Thin Films

Pseudo-Crystalline Silicon Thin Films with Carbon Nanotube Electron Beam Exposure

2017 ◽  
Vol 17 (11) ◽  
pp. 7852-7858
Author(s):  
Ha Rim Lee ◽  
Jung Su Kang ◽  
Min Tea Chung ◽  
Kyu Chang Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Carbon Nanotube ◽  
Crystalline Silicon ◽  
Silicon Thin Films

Structural Properties of Carbon Nanotube Electron Beam (C-Beam) Crystallization Silicon Thin Films

2017 ◽  
Vol 9 (6) ◽  
pp. 962-966
Author(s):  
Su Woong Lee ◽  
Jung Su Kang ◽  
Ha Rim Lee ◽  
Kyu Chang Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Carbon Nanotube ◽  
Structural Properties ◽  
Silicon Thin Films

Internal Stress Change of Phosphorus-Doped Amorphous Silicon Thin Films During Crystallization

1994 ◽  
Vol 343 ◽  
Author(s):  
Hideo Miura ◽  
Asao Nishimura
Keyword(s):  
Thin Films ◽  
Tensile Stress ◽  
Internal Stress ◽  
Crystallization Process ◽  
Chemical Vapor ◽  
Stress Change ◽  
Silicon Thin Films ◽  
Stress Changes ◽  
Phosphorus Doped ◽  
Deposited Films

ABSTRACTInternal stress change of phosphorus-doped silicon thin films during crystallization is measured by detecting substrate curvature change using a scanning laser microscope. The films are deposited in an amorphous phase by chemical vapor deposition using Si2H6 gas. The deposited films have compressive stress of about 200 MPa. The internal stress changes significantly to a tensile stress of about 800 MPa at about 600 °C due to shrinkage of the films during crystallization. The high tensile stress can be relaxed by annealing above 800 °C. The phosphorus doping changes the crystallization process of the films and their final residual stress.

Cathodoluminescence properties of silicon thin films crystallized by electron beam exposure

2013 ◽  
Author(s):  
Seon Yong Park ◽  
Su Woong Lee ◽  
Jung Soo Kang ◽  
Ha Rim Lee ◽  
Mi Yeon Joo ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Silicon Thin Films
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