Effects of the Duty Ratio on the Niobium Oxide Film Deposited by Pulsed-DC Magnetron Sputtering Methods

2013 ◽  
Vol 13 (11) ◽  
pp. 7760-7765
Author(s):  
Ji Mi Eom ◽  
Hyun Gon Oh ◽  
Il Hwan Cho ◽  
Sang Jik Kwon ◽  
Eou Sik Cho
Keyword(s):  
Oxide Film ◽  
Magnetron Sputtering ◽  
Niobium Oxide ◽  
Duty Ratio ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Effects of sputtering power toward the Al-doped ZnO thin Film prepared by pulsed DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6466-6471 ◽  
Author(s):  
Kittikhun Seawsakul ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Viyapol Pattantsetakul ◽  
Saksorn Limwichean ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Zno Thin Film ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Sputtering Power ◽  
Doped Zno ◽  
Pulsed Dc Magnetron Sputtering
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