Titanium Dioxide Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition for OLED Passivation

2008 ◽  
Vol 8 (9) ◽  
pp. 4726-4729 ◽  
Author(s):  
Woong-Sun Kim ◽  
Myoung-Gyun Ko ◽  
Tae-Sub Kim ◽  
Sang-Kyun Park ◽  
Yeon-Keon Moon ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Transmission Rate ◽  
Atomic Layer ◽  
Titanium Dioxide Film ◽  
Uncoated Sample ◽  
Layer Deposition ◽  
Titanium Dioxide Thin Films ◽  
Dioxide Film

Plasma enhanced atomic layer deposition (PEALD) of titanium dioxide thin films was conducted using Tetrakis dimethylamino titanium (TDMATi) and an oxygen plasma on a polyethersulfon (PES) substrate at a deposition temperature of 90 °C. The effects of the induced plasma power on passivation properties were investigated according to film thickness. The growth rate of the titanium dioxide film was 0.8 Å/cycle, and the water vapor transmission rate (WTVR) for a 80 nm titanium dioxide film was 0.023 g/m2·day. The passivation performance of the titanium dioxide film was investigated using an organic light-emitting diode (OLED). The coated OLED lifetime was 90 h, 15 times longer than that of an uncoated sample.

Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone

2009 ◽  
Vol 113 (52) ◽  
pp. 21825-21830 ◽  
Author(s):  
Martin Rose ◽  
Jaakko Niinistö ◽  
Pawel Michalowski ◽  
Lukas Gerlich ◽  
Lutz Wilde ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Titanium Dioxide Thin Films ◽  
Cp Ti

scholarly journals Titanium dioxide thin films by atomic layer deposition: a review

2017 ◽  
Vol 32 (9) ◽  
pp. 093005 ◽  
Author(s):  
Janne-Petteri Niemelä ◽  
Giovanni Marin ◽  
Maarit Karppinen
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Titanium Dioxide Thin Films

scholarly journals The optical parameters of TiO2 antireflection coating prepared by atomic layer deposition method for photovoltaic application

2020 ◽  
Vol 50 (4) ◽  
Author(s):  
Marek Szindler ◽  
Magdalena M. Szindler
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Energy Dispersive Spectrometer ◽  
Atomic Layer ◽  
Antireflection Coating ◽  
Optical Parameters ◽  
Tio2 Thin Films ◽  
Layer Deposition ◽  
Vis Spectroscopy ◽  
Titanium Dioxide Thin Films

Titanium dioxide thin films have been deposited on silicon wafers substrates by an atomic layer deposition (ALD) method. There optical parameters were investigated by spectroscopic ellipsometry and UV/VIS spectroscopy. A material with a refractive index of 2.41 was obtained. Additionally, in a wide spectral range it was possible to reduce the reflection from the silicon surface below 5%. The Raman spectroscopy method was used for structural characterization of anatase TiO2 thin films. Their uniformity and chemical composition are confirmed by a scanning electron microscope (SEM) energy dispersive spectrometer (EDS).

Atomic layer deposition of thin films of titanium dioxide from titanium tetramethoxide and water

2013 ◽  
Vol 86 (3) ◽  
pp. 326-331 ◽  
Author(s):  
A. P. Alekhin ◽  
A. M. Markeev ◽  
D. V. Ovchinnikov ◽  
A. A. Soloviev ◽  
V. F. Toknova
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Structure and optical properties of TiO2 thin films deposited by ALD method

Open Physics ◽  
2017 ◽  
Vol 15 (1) ◽  
pp. 1067-1071 ◽  
Author(s):  
Marek Szindler ◽  
Magdalena M. Szindler ◽  
Paulina Boryło ◽  
Tymoteusz Jung
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Energy Dispersive Spectrometer ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
X Ray Crystallography ◽  
Systems Software ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method ◽  
Titanium Dioxide Thin Films

AbstractThis paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical composition were also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.

Sign in / Sign up

Export Citation Format

Share Document