Atomic Force Microscopic Observation of the Molecular Orientation in Ultrathin Films of Alkanoic Acid-Derivatized Porphyrins on a Mica Surface

2002 ◽  
Vol 2 (1) ◽  
pp. 37-40 ◽  
Author(s):  
Toyoko Imae ◽  
Tohru Niwa ◽  
Zhijun Zhang
Keyword(s):  
Ultrathin Films ◽  
Microscopic Observation ◽  
Molecular Orientation ◽  
Mica Surface ◽  
Alkanoic Acid ◽  
Atomic Force

Direct observation of surfactant aggregate behavior on a mica surface using high-speed atomic force microscopy

2011 ◽  
Vol 47 (17) ◽  
pp. 4974 ◽  
Author(s):  
Shigeto Inoue ◽  
Takayuki Uchihashi ◽  
Daisuke Yamamoto ◽  
Toshio Ando
Keyword(s):  
Atomic Force Microscopy ◽  
Direct Observation ◽  
High Speed ◽  
Mica Surface ◽  
Force Microscopy ◽  
Atomic Force ◽  
Aggregate Behavior

Lateral Size of Self-Patterned Nanostructures Controlled by Multi-Step Deposition

2005 ◽  
Vol 106 ◽  
pp. 117-122 ◽  
Author(s):  
Izabela Szafraniak ◽  
Dietrich Hesse ◽  
Marin Alexe
Keyword(s):  
Electron Microscopy ◽  
Ultrathin Films ◽  
Lateral Size ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Non Volatile Memory ◽  
Ferroelectric Capacitors ◽  
Scanning Electron

Self-patterning presents an appealing alternative to lithography for the production of arrays of nanoscale ferroelectric capacitors for use in high density non-volatile memory devices. Recently a self-patterning method, based on the use of the instability of ultrathin films during hightemperature treatments, was used to fabricate nanosized ferroelectrics. This paper reports the use of the method for the preparation of PZT nanoislands on different single crystalline substrates - SrTiO3, MgO and LaAlO3. Moreover, a multi-step deposition procedure in order to control lateral the dimension of the crystals was introduced. The nanostructures obtained were studied by atomic force microscopy, scanning electron microscopy and X-ray diffraction.

Self-assembly layer-by-layer fabrication using porphyrin dye anion and polycation

2009 ◽  
Vol 13 (07) ◽  
pp. 774-778 ◽  
Author(s):  
Byung-Soon Kim ◽  
Young-A Son
Keyword(s):  
Ultrathin Films ◽  
Self Assembly ◽  
Film Surface ◽  
Layer By Layer ◽  
Preparation Technique ◽  
Force Microscopy ◽  
Atomic Force ◽  
Diallyldimethylammonium Chloride ◽  
Afm Analysis ◽  
Progressive Growth

In this study, self-assembled alternating film using poly(diallyldimethylammonium chloride) (PDDAC) and meso-tetrakis(4-carboxyphenyl)porphyrin (MTCP) was prepared as a multilayer deposition on glass substrate. This preparation technique for dye deposition may provide new feasibilities to achieve the manufacture of ultrathin films for nanotechnology application. The deposition films were characterized by UV-vis spectrophotometer and Atomic Force Microscopy (AFM) analysis. The results of UV-vis spectra showed that the absorbance characteristic of the multilayer films linearly increased with an increased number of PDDAC and MTCP bilayers. AFM analysis showed the film surface was relatively uniform and the progressive growth of layers was determined.

Synthesis, Film Morphology and Performance of a Functional Polysiloxane Containing Polyether, Epoxy and Trifluoropropyl Side Groups

2011 ◽  
Vol 480-481 ◽  
pp. 624-628
Author(s):  
Wei Xu ◽  
Qiu Feng An ◽  
Wei Xu
Keyword(s):  
Silicon Wafer ◽  
Molecular Orientation ◽  
Substrate Surface ◽  
Proton Nuclear Magnetic Resonance ◽  
Film Morphology ◽  
Water Contact ◽  
Atomic Force ◽  
Wafer Substrate ◽  
Finishing Agent ◽  
And Performance

A novel polysiloxane (PSA-PFMS) fabric finishing agent, bearing pendant stearyl acrylate, polyether, epoxy and trifluoropropyl side groups, etc., was synthesized by hydrosilylation of polytrifluoropropylhydromethylsiloxane (PFHMS), stearyl acrylate (SA), allylpolyoxyethylene ether (PEO) and allylglyeidyl ether (AGE). The chemical structure of PSA-PFMS was characterized by infrared spectrum (IR) and proton nuclear magnetic resonance (1H NMR). Film morphology and molecular orientation of PSA-PFMS on silicon wafer substrate surface were observed by atomic force microscope (AFM). Results show that PSA-PFMS can form an inhomogeneous and hydrophobic polysiloxane film with rough, scraggly and microscopic phase separation structures. All of these suggest that the molecular orientation of PSA-PFMS is in such a manner that the stearyl acrylate groups, trifluoropropyl and silicon methyl groups project outward into air, while polyether and Si-O dipole bonds point to the silicon wafer substrate surface. Owing to this highly rough and microscopic phase-separated hydrophobic film and its tight link with fabric, the treated fabrics are altered from hydrophile to hydrophobe with water contact angle of 129.2° and possess favorable washing endurance with WCA of 106.7° after 20 times of standard soaping procedure.

Atomic Force Microscopic Observation of Random Molecular Arrangement in Dialkyl Guanidinium Monolayer

1996 ◽  
Vol 25 (10) ◽  
pp. 857-858 ◽  
Author(s):  
Yushi Oishi ◽  
Takayuki Kato ◽  
Miyuki Kuramori ◽  
Kazuaki Suehiro ◽  
Katsuhiko Ariga ◽  
...  
Keyword(s):  
Microscopic Observation ◽  
Molecular Arrangement ◽  
Atomic Force

scholarly journals High-Speed Atomic Force Microscopic Observation of ATP-Dependent Rotation of the AAA+ Chaperone p97

Structure ◽  
2013 ◽  
Vol 21 (11) ◽  
pp. 1992-2002 ◽  
Author(s):  
Kentaro Noi ◽  
Daisuke Yamamoto ◽  
Shingo Nishikori ◽  
Ken-ichi Arita-Morioka ◽  
Takayuki Kato ◽  
...  
Keyword(s):  
Microscopic Observation ◽  
High Speed ◽  
Atomic Force
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