Chemical Vapor Deposition Synthesis of Carbon Nanotube Using Pyrolysis Gas Products of Apricot Kernel Shell

2020 ◽  
Vol 12 (4) ◽  
pp. 556-563
Author(s):  
B. Köse Gedik ◽  
Y. Önal ◽  
C. Akmil Başar ◽  
Y. Akbulut
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Cobalt Acetate ◽  
Hot Water ◽  
High Yield ◽  
Pyrolysis Gas ◽  
Metal Acetate ◽  
Apricot Kernel ◽  
Quartz Boat

The results of a study of carbon nanotubes (CNTs) growth using apricot stone (AS) as a carbon source are presented. The described method here is two-zone thermal chemical vapor deposition (CVD) that uses cobalt acetate directly as deposition medium at different geometries under argon flow of 100 mL min–1. Argon gas was fed into the oven until pyrolysis of apricot kernel started. Since pyrolysis started, argon was passed through toluene immersed in hot water in the gas washing flask and sent to the furnace for CNT formation. This method allows the bulk metal acetate surface over a quartz road and in a quartz boat to act as catalyst for CNT growth. Our recent results obtained from the toluene assisted growth. The effect of growth temperature and purification of CNTs was studied. As-grown and purified CNTs were characterized by scanning electron microscopy (SEM), X-ray diffraction, differential thermal analysis and surface analysis. High yield of CNTs were obtained over quartz road at 900 °C and at the same temperature with 48 hours deposition time in quartz boat. The obtained CNTs were purified by refluxing using nitric acid.

scholarly journals High-yield single-step catalytic growth of graphene nanostripes by plasma enhanced chemical vapor deposition

Carbon ◽  
2018 ◽  
Vol 129 ◽  
pp. 527-536 ◽  
Author(s):  
Chen-Chih Hsu ◽  
Jacob D. Bagley ◽  
Marcus L. Teague ◽  
Wei-Shiuan Tseng ◽  
Kathleen L. Yang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Step ◽  
High Yield ◽  
Catalytic Growth

scholarly journals Production of Carbon Nanofibers Using a CVD Method with Lithium Fluoride as a Supported Cobalt Catalyst

2008 ◽  
Vol 2008 ◽  
pp. 1-5 ◽  
Author(s):  
S. A. Manafi ◽  
S. H. Badiee
Keyword(s):  
Chemical Vapor Deposition ◽  
Electron Microscope ◽  
Carbon Nanofibers ◽  
Vapor Deposition ◽  
Large Scale ◽  
Chemical Vapor ◽  
High Yield ◽  
Scale Production ◽  
Catalytic Chemical Vapor Deposition ◽  
Fundamental Understanding

Carbon nanofibers (CNFs) have been synthesized in high yield (>70%) by catalytic chemical vapor deposition (CCVD) on Co/LiF catalyst using acetylene as carbon source. A novel catalyst support (LiF) is reported for the first time as an alternative for large-scale production of carbon nanofibers while purification process of nanofibers is easier. In our experiment, the sealed furnace was heated at700∘Cfor 0.5 hour (the heating rate was10∘C/min) and then cooled to room temperature in the furnace naturally. Catalytic chemical vapor deposition is of interest for fundamental understanding and improvement of commercial synthesis of carbon nanofibers (CNFs). The obtained sample was sequentially washed with ethanol, dilutes acid, and distilled water to remove residual impurities, amorphous carbon materials, and remaining of catalyst, and then dried at110∘Cfor 24 hours. The combined physical characterization through several techniques, such as high-resolution transmission electron microscope (TEM), scanning electron microscope (SEM), thermogarvimetric analysis (TGA), and zeta-sizer and Raman spectroscopy, allows determining the geometric characteristic and the microstructure of individual carbon nanofibers. Catalytic chemical vapor deposition is of interest for fundamental understanding and improvement of commercial synthesis of carbon nanofibers (CNFs). As a matter of fact, the method of CCVD guarantees the production of CNFs for different applications.

Development and Implementation of Large Area, Economical Rotating Disk Reactor Technology for Metalorganic Chemical Vapor Deposition

1993 ◽  
Vol 335 ◽  
Author(s):  
G. S. Tompa ◽  
P. A. Zawadzki ◽  
M. Mckee ◽  
E. Wolak ◽  
K. Moy ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Rotating Disk ◽  
High Yield ◽  
Thermal Dynamics ◽  
Material Systems ◽  
Rotating Disk Reactor ◽  
Metalorganic Chemical

AbstractThe vertical, high speed, rotating disk reactor (RDR) has, in recent years, found broad application in the Metalorganic Chemical Vapor Deposition of a variety of material systems. These applications include epitaxial films of III-V and II-VI compound semiconductors, oxides (such as YBCO superconductors/ferroelectrics and SiO2, amongst others), Group IV materials (such as diamond and SiC), and metals (such as copper and tungsten). As production of these material systems increases, so too does the need for economical, high yield equipment capable of producing these materials with high levels of uniformity and repeatability. We have used computational fluid dynamic modeling to investigate the complex flow and thermal dynamics required for scaling existing RDRs (as large as a 7.25″ diameter disk handling up to 3×3″ wafers) to larger dimensions (11″ and 12″ diameter disks for multiple 4″ and 15.5″ diameter disk for 3×6″ wafers). The scaling parameters predicted by the modeling codes are reviewed and correlate well with experimental results. Materials results on GaAs films using TBAs, TMGa, and TMA1 for the 11″ diameter system routinely demonstrate within wafer thickness uniformities of <1.1% for 3×4″ wafers, as well as for 6″ or 8″ diameters, wafer to wafer uniformities <1% and run to run repeatabilities within 1%. These results are verified by SEM analysis, as well as with GaAs/AJGaAs Bragg reflectors. The excellent results on the 11″ and 15.5″ diameter platters combined with modeling indicated that 4×4″ wafers on a 12″ diameter platter would produce ideal films which, indeed, is the case. The 11″ diameter results have been surpassed, demonstrating <0.9% for >9″ diameters (4×4″ wafers) on a 12″ diameter susceptor. With high reactant efficiencies (>3 6%), short cycle times between growths using the loadlock, and minimal maintenance requirements, the costs per wafer in a cost of ownership model are found to be dramatically less than in competitive technologies.

Nanostructured carbon generated by chemical vapor deposition from acetylene on surfaces pretreated by a combination of physical and chemical methods

2000 ◽  
Vol 15 (10) ◽  
pp. 2087-2090 ◽  
Author(s):  
Andrea Siska ◽  
Zoltán Kónya ◽  
Klára Hernádi ◽  
Imre Kiricsi ◽  
Krisztián Kordás ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Laser Irradiation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Catalytic Decomposition ◽  
Catalyst System ◽  
Cobalt Acetate ◽  
Acetate Solution ◽  
Physical And Chemical

Chemical vapor deposition of carbon nanotubes by catalytic decomposition of acetylene on V2O5 microtube crystals is presented. The catalyst was prepared by laser irradiation of vanadium sheets and treated with cobalt acetate solution. The carbon deposits generated on this novel type of catalyst were characterized by transmission electron microscopy measurements. Both carbon nanofibers and carbon nanotubes were found to be formed. This catalyst system, generated by the combined laser irradiation and chemical impregnation methods, is a new and promising way to study the differences in the mechanism of the generation of nanostructures.

High-yield synthesis of SnO2 nanobelts by water-assisted chemical vapor deposition for sensor applications

2012 ◽  
Vol 47 (11) ◽  
pp. 3277-3282 ◽  
Author(s):  
Jing Bo Zhang ◽  
Xiao Ning Li ◽  
Shou Li Bai ◽  
Rui Xian Luo ◽  
Ai Fan Chen ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Yield ◽  
Sensor Applications ◽  
Sno2 Nanobelts
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