scholarly journals Comparative Analysis of 6T, 7T, 8T, 9T, and 10T Realistic CNTFET Based SRAM

2017 ◽  
Vol 2017 ◽  
pp. 1-9 ◽  
Author(s):  
Shital Joshi ◽  
Umar Alabawi

CMOS technology below 10 nm faces fundamental limits which restricts its applicability for future electronic application mainly in terms of size, power consumption, and speed. In digital electronics, memory components play a very significant role. SRAM, due to its unique ability to retain data, is one of the most popular memory elements used in most of the digital devices. With aggressive technology scaling, the design of SRAM is seriously challenged in terms of delay, noise margin, and stability. This paper compares the performance of various CNTFET based SRAM cell topologies like 6T, 7T, 8T, 9T, and 10T cell with respect to static noise margin (SNM), write margin (WM), read delay, and power consumption. To consider the nonidealities of CNTFET, variations in tube diameter and effect of metallic tubes are considered for various structures with respect to various performance metrics like SNM, WM, read delay, and power consumption.

Memories are an essential unit of any digital circuit, thus their power consumption must be considered during the designing process of the cells. To improve performance, reduce delay and increase stability, it is advisable to decrease the power consumed by the memory. Due to high demand of speed, high performance, there’s a need to decrease the size of the device, thereby increasing the devices placed per chip. This high integration makes chips more complex but improves device performance. Design of SRAM cells with speed and low power is crucial so as to replace DRAMs. The layout of SRAM has advanced to meet the requirements of the present industry in accordance with parameters like delay, power consumption and stability etc. This paper presents the aim of analyzing different technologies used to make SRAM more efficient in terms of parameters such as static noise margin, latency and dissipation of power. The stability investigation of SRAM cells are usually derived from the Static Noise Margin (SNM) analysis. Here we observe a SRAM design which has used dynamic logic and pass transistor logic. We further study the effects made on this design by employing various technologies such as AVL-S, AVL-G, AVL and MT-CMOS, at 180nm CMOS technology to achieve enhancements in delay, power consumption and performance. The proposed circuits are simulated and the results obtained have been analyzed to show significant improvement over conventional SRAM designs. Cadence Virtuoso simulation is used to confirm all the results obtained in this paper for the simulation of 180 nm CMOS technology SRAMs.


This paper examines the factors that affect the Static Noise Margin (SNM) of a Static Random Access memories which focus on optimizing Read and Write operation of 8T SRAM cell which is better than 6T SRAM cell Using Swing Restoration for Dual Node Voltage. The read and Write time and improve Stability. New 8T SRAM technique on the circuit or architecture level is required. In this paper Comparative Analysis of 6T and 8T SRAM Cells with Improved Read and Write Margin is done for 130 nm Technology with Cadence Virtuoso schematics Tool.


2021 ◽  
Vol 23 (05) ◽  
pp. 211-215
Author(s):  
Hima Bindu Katikala ◽  
◽  
G. Ramana Murthy ◽  
P. Raja Rajeswari ◽  
P. Sai Charan ◽  
...  

For high speed application the static random access memory is mostly demandable. Such kind of device should possess additive parameters that can withstand during transistor scaling process. Their exist static noise margin (SNM) which degrades the device performance of memory architectures, majorly observed at write and read operation create write noise margin (WNM) and read noise margin (RNM). In this paper we discuss about the basic design of 6 transistor SRAM (6T SRAM) using 180nm and 45nm CMOS technology in Cadence Virtuoso with write noise margin analysis. The propagation delay, power dissipation, WNM are measured for both the technologies and observed that WNM is relatively low in 45nm.


2019 ◽  
Vol 2019 (HiTen) ◽  
pp. 000011-000015 ◽  
Author(s):  
Affan Abbasi ◽  
Robert Murphree ◽  
Sajib Roy ◽  
Marvin Suggs ◽  
John Fraley ◽  
...  

Abstract Electronic systems capable of withstanding high temperature environments are in high demand in various applications such as logging-while-drilling (LWD) systems and embedded electronics which are in the core of gas turbine engine controls. Designing memory that can process massive amounts of data in harsh environments while consuming low power opens doors for next generation, smart, high temperature electronic systems. In this work, a CMOS based six transistor (6T) static random-access memory (SRAM) cell is designed and implemented in a state-of-the-art SiC 1μm triple well CMOS process. The designed SiC SRAM cell performance has been characterized for different values of cell ratios (CR) [0.5, 0.6, 1, 1.5, 2, 2.5] and pull-up ratios (PR) [1, 2, 3, 4, 5, 6] to determine the cell size with optimal performance parameters. Static noise margin (SNM) values for the different combinations of CR and PR are calculated using the model developed by Seevinck, et. al. [13]. The highest SNM values observed at 25°C and 300°C are 4.71 V and 4.65 V, respectively. Read static noise margin (RSNM) values of 1.94 V and 1.90 V are achieved at 25°C and 300°C, respectively. Analysis of measured data shows that the optimum cell size is with a CR of 2.5 and a PR of 6. However, these results are significantly impacted by highly resistive ohmic contacts.


2017 ◽  
Vol MCSP2017 (01) ◽  
pp. 7-10 ◽  
Author(s):  
Subhashree Rath ◽  
Siba Kumar Panda

Static random access memory (SRAM) is an important component of embedded cache memory of handheld digital devices. SRAM has become major data storage device due to its large storage density and less time to access. Exponential growth of low power digital devices has raised the demand of low voltage low power SRAM. This paper presents design and implementation of 6T SRAM cell in 180 nm, 90 nm and 45 nm standard CMOS process technology. The simulation has been done in Cadence Virtuoso environment. The performance analysis of SRAM cell has been evaluated in terms of delay, power and static noise margin (SNM).


Author(s):  
Jitendra Kumar Mishra ◽  
Lakshmi Likhitha Mankali ◽  
Kavindra Kandpal ◽  
Prasanna Kumar Misra ◽  
Manish Goswami

The present day electronic gadgets have semiconductor memory devices to store data. The static random access memory (SRAM) is a volatile memory, often preferred over dynamic random access memory (DRAM) due to higher speed and lower power dissipation. However, at scaling down of technology node, the leakage current in SRAM often increases and degrades its performance. To address this, the voltage scaling is preferred which subsequently affects the stability and delay of SRAM. This paper therefore presents a negative bit-line (NBL) write assist circuit which is used for enhancing the write ability while a separate (isolated) read buffer circuit is used for improving the read stability. In addition to this, the proposed design uses a tail (stack) transistor to decrease the overall static power dissipation and also to maintain the hold stability. The comparison of the proposed design has been done with state-of-the-art work in terms of write static noise margin (WSNM), write delay, read static noise margin (RSNM) and other parameters. It has been observed that there is an improvement of 48%, 11%, 19% and 32.4% in WSNM while reduction of 33%, 39%, 48% and 22% in write delay as compared to the conventional 6T SRAM cell, NBL, [Formula: see text] collapse and 9T UV SRAM, respectively.


2021 ◽  
Vol 7 ◽  
pp. 22-34
Author(s):  
Vinod Kumar ◽  
Ram Murti Rawat

A paper that examines the factors thataffect the Static Noise Margin (SNM) of a StaticRandom Access memories. At an equivalent time,they specialise in optimizing Read and Writeoperation of 8T SRAM cell which is best than 6TSRAM cell Using Swing Restoration Dual NodeVoltage. The read and Write operation and improveStability analysis. This SRAM technique on thecircuit or architecture level is required to improveread and write operation. during this paperComparative Analysis of 6T and 8T SRAM Cellswith Improved Read and Write Margin is completedfor 180 nm Technology with Cadence Virtuososchematics Tool.This Paper is organized as follows: thecharacteristics of 6T SRAM cell are described arerepresented in section VIII. In section IX, proposed8T SRAM cell is described. In section X, Standard8T SRAM cell is described. Section XI includes thesimulation results which give comparison of variousparameters of 6T and 8T SRAM cells. In Section XIISimulation Results and DC analysis and sectionXIII conclusion the work.


Author(s):  
Yogesh Shrivastava ◽  
Tarun Kumar Gupta

Ternary logic has been demonstrated as a superior contrasting option to binary logic. This paper presents a ternary subtractor circuit in which the input signal is converted into binary. The proposed design is implemented using Carbon Nanotube Field Effect Transistor (CNTFET), a forefront innovation. A correlation has been made in the proposed design on parameters like Power-Delay Product (PDP), Energy Delay Product (EDP), average power consumption, delay and static noise margin. Every one of these parameters is obtained by simulating the circuits on the HSPICE simulator. The proposed design indicates an improvement of 60.14%, 59.34%, 74.98% and 84.28%, respectively, in power consumption, delay, PDP and EDP individually in correlation with recent designs. The increased carbon nanotubes least affect the proposed subtractor design. In noise analysis, the proposed design outperformed all the existing designs.


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