scholarly journals Optical Characterization of Different Thin Film Module Technologies

2015 ◽  
Vol 2015 ◽  
pp. 1-12 ◽  
Author(s):  
R. Ebner ◽  
B. Kubicek ◽  
G. Újvári ◽  
S. Novalin ◽  
M. Rennhofer ◽  
...  

For a complete quality control of different thin film module technologies (a-Si, CdTe, and CIS) a combination of fast and nondestructive methods was investigated. Camera-based measurements, such as electroluminescence (EL), photoluminescence (PL), and infrared (IR) technologies, offer excellent possibilities for determining production failures or defects in solar modules which cannot be detected by means of standard power measurements. These types of optical measurement provide high resolution images with a two-dimensional distribution of the characteristic features of PV modules. This paper focuses on quality control and characterization using EL, PL, and IR imaging with conventional cameras and an alternative excitation source for the PL-setup.

1988 ◽  
Vol 121 ◽  
Author(s):  
Lawrence W. Hrubesh ◽  
Cynthia T. Alviso

ABSTRACTTwo optical methods are described for mapping the local variations of refractive index within monoliths of porous silica aerogel. One is an interferometrie measurement that produces “iso-index” fringes in a two dimensional image; an orthogonal view gives the third dimension information. The other method uses the deflection of a He-Ne laser beam to map the gradient index within a sample. The quantification of the measurements is described and the accuracy of the results is discussed.


2007 ◽  
Vol 101 (8) ◽  
pp. 084107 ◽  
Author(s):  
El Hassane Oulachgar ◽  
Cetin Aktik ◽  
Mihai Scarlete ◽  
Starr Dostie ◽  
Rob Sowerby ◽  
...  

2013 ◽  
Vol 662 ◽  
pp. 243-248
Author(s):  
Wen Yuan Deng

The optical characterization of LaF3 thin film in DUV spectral range was experimental investigated by using a variable angle purged UV spectroscopic ellipsometer. In order to take into account the inhomogeneity, a theory model that dividing the single thin film into several sublayers was adopted. Two kinds of LaF3 thin films fabricated on fused silicate substrate with different substrates temperature were tested. From the obtained optical index and the physical thickness of different sublayer in the two different kinds of LaF3 thin films, it was found that, the inhomogeneity of the LaF3 thin film deposited with substrate temperature at 300°C was stronger than that of the LaF3 thin film deposited with substrate temperature at 250°C, indicating that the substrate temperature has important influence on the optical index and inhomogeneity of LaF3 thin films. For both of the two kinds LaF3 thin films, the agreement between the measured transmittance and the simulated transmittance using the parameters from regression of SE was nice, indicating that the selection of the material dispersion law and regression procedure were successful.


1992 ◽  
Author(s):  
Peter K. Schenck ◽  
David W. Bonnell ◽  
John W. Hastie ◽  
Lawrence P. Cook ◽  
C. K. Chiang

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