scholarly journals Structure and Friction Behavior of CrNx/a-C:H Nanocomposite Films

2014 ◽  
Vol 2014 ◽  
pp. 1-6
Author(s):  
Lunlin Shang ◽  
Guangan Zhang ◽  
Zhongrong Geng
Keyword(s):  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Chromium Carbide ◽  
Amorphous Carbon ◽  
Nanocomposite Films ◽  
Xps Analysis ◽  
Friction Behavior ◽  
Si Substrates ◽  
Diffraction Peaks ◽  
Deposited Films

CrN and CrNx/a-C:H nanocomposite films were deposited on Si substrates by the magnetron sputtering technique. The structure, chemical state, and friction behavior of the CrNx/a-C:H films prepared at various CH4 content were studied systematically. The CrN film shows strong (111) and (220) orientation, while the CrNx/a-C:H films consist of the nanocrystalline CrNx or Cr particles embedded in an amorphous hydrocarbon (a-C:H) matrix and show weak diffraction peaks, which is in accordance with the XPS analysis results. The typical Raman D and G peaks are observed, indicating that the separated amorphous carbon or CNx phase appears in the CrNx/a-C:H films. However, no chromium carbide was observed in all the as-deposited samples. From the SEM graphs, all the deposited films depicted a dense and compact microstructure with well-attached interface with the substrate. The average friction coefficient of the CrNx/a-C:H films largely decreased with increasing CH4 content.

Effect of Substrate-Target Distance on the Structure of TiCrN Films Deposited from Mosaic Target by Reactive DC Magnetron Sputtering

2019 ◽  
Vol 798 ◽  
pp. 163-168
Author(s):  
Nirun Witit-Anun ◽  
Adisorn Buranawong
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Magnetron Sputtering ◽  
Crystal Size ◽  
Target Distance ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Unbalanced Magnetron ◽  
Deposited Films

Titanium chromium nitride (TiCrN) thin films were deposited on Si substrates by reactive DC unbalanced magnetron sputtering from the Ti-Cr mosaic target. The effect of substrate-to-target distances (dst) on the structure of TiCrN thin films were investigated. The crystal structure, microstructure, thickness, roughness and chemical composition were characterized by glancing angle X-ray diffraction (GAXRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) and energy dispersive X-ray spectroscopy (EDS) technique, respectively. The results showed that, all the as-deposited films were formed as a (Ti,Cr)N solid solution. The as-deposited films exhibited a nanostructure with a crystal size less than 65 nm. The crystal size of all plane were in the range of 36.3 – 65.7 nm. The lattice constants were in the range of 4.169 Å to 4.229 Å. The thickness and roughness decrease from 500 nm to292 nm and 3.6 nm to 2.2 nm, respectively, with increasing the substrate-to-target distance. The chemical composition, Ti, Cr and N contents, of the as-deposited films were varied with the substrate-to-target distance. The as-deposited films showed compact columnar and dense morphology as a result of increasing the substrate-to-target distance.

scholarly journals High-temperature friction behavior of amorphous carbon coating in glass molding process

Friction ◽  
2020 ◽  
Author(s):  
Kangsen Li ◽  
Gang Xu ◽  
Xiaobin Wen ◽  
Jun Zhou ◽  
Feng Gong
Keyword(s):  
High Temperature ◽  
Friction Coefficient ◽  
Service Life ◽  
Friction Force ◽  
Amorphous Carbon ◽  
Carbon Coating ◽  
Contact Interface ◽  
Molding Process ◽  
Friction Behavior ◽  
Glass Molding

AbstractIn the glass molding process, the sticking reaction and fatigue wear between the glass and mold hinder the service life and functional application of the mold at the elevated temperature. To improve the chemical inertness and anti-friction properties of the mold, an amorphous carbon coating was synthesized on the tungsten carbide-cobalt (WC–8Co) substrate by magnetron sputtering. The friction behavior between the glass and carbon coating has a significant influence on the functional protection and service life of the mold. Therefore, the glass ring compression tests were conducted to measure the friction coefficient and friction force of the contact interface between the glass and amorphous carbon coating at the high temperature. Meanwhile, the detailed characterization of the amorphous carbon coating was performed to study the microstructure evolution and surface topography of the amorphous carbon coating during glass molding process by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), Ramon spectroscopy, and atomic force microscope (AFM). The results showed that the amorphous carbon coating exhibited excellent thermal stability, but weak shear friction strength. The friction coefficient between the glass and coating depended on the temperature. Besides, the service life of the coating was governed by the friction force of the contact interface, processing conditions, and composition diffusion. This work provides a better understanding of the application of carbon coatings in the glass molding.

Characteristics of Palladium Doped Amorphous Carbon Films Fabricated by Unbalanced Magnetron Sputtering System

2021 ◽  
Vol 16 (6) ◽  
pp. 905-910
Author(s):  
Yong Seob Park ◽  
Young-Baek Kim ◽  
Sung Hwan Hwang ◽  
Jaehyeong Lee
Keyword(s):  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Amorphous Carbon ◽  
Closed Field ◽  
Hydrogenated Amorphous Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Dc Bias ◽  
Hydrogenated Amorphous

Generally, hydrogenated amorphous carbon (a-C:H) has been shown to have a low friction coefficient, high hardness, and low abrasive wear rate. In this study, Pd doped hydrogenated amorphous carbon (a-C:H:Pd) fabricated by the closed-field unbalanced magnetron sputtering (CFUBMS) system with two targets of carbon and palladium in Ar/C2H2 plasma. The tribological and lubricant characteristics for a-C:H:Pd fabricated with various DC bias voltage from 0 to −200 V were investigated. We obtained a hardness up to 27.5 GPa and friction coefficient lower than 0.1. The atomic percentage of Pd related to the lubricant properties increased up to 22% at −200 V. In the results, the Pd doping in the a-C:H films improved the tribological and lubricant properties. The friction coefficient value of a-C:H:Pd films was decreased, the hardness and elastic modulus were increased, and also the adhesion properties was improved with the increase of negative DC bias voltage.

On the Effects of the Thermal Treatment on the Structural, Mechanical and Tribological Properties of Amorphous Carbon-Nitrogen Films Deposited by Magnetron Sputtering

1997 ◽  
Vol 498 ◽  
Author(s):  
M. M. Lacerda ◽  
F. L. Freire
Keyword(s):  
Surface Roughness ◽  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Internal Stress ◽  
Amorphous Carbon ◽  
Rutherford Backscattering Spectrometry ◽  
Rf Magnetron Sputtering ◽  
Progressive Increase ◽  
Nuclear Reaction Analysis ◽  
Elastic Recoil

ABSTRACTAmorphous carbon-nitrogen films, a-CNx, deposited by rf-magnetron sputtering in N2 atmosphere were annealed in vacuum at temperatures between 300 and 700 °C. The annealing time was 30 minutes. The modifications on the film microstructure were monitored by infrared spectroscopy (IR), while the composition and the atomic density were determined by Rutherford backscattering spectrometry (RBS), elastic recoil detection analysis (ERDA) and nuclear reaction analysis (NRA). The internal stress was determined by measuring the film-induced bending of the substrate and the hardness was measured by nanoindentation. Atomic force microscopy (AFM) provided the friction coefficient and the surface roughness. The ratio between nitrogen and carbon atomic concentration decreases for temperatures higher than 500 °C, whereas the film density increases with the annealing temperature: 40 % in the temperature range here studied. The behavior of the D and G Raman bands, IR active due to the nitrogen incorporation in the carbon network, suggests a progressive increase of the size of the graphite-like domains. The hardness of the as-deposited a-CNx film is around 2 GPa. However, both hardness and internal stress increase by a factor of three in samples annealed at 700 °C, while the surface roughness and the friction coefficient decrease by a factor of about two.

STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF ANNEALED MoO3 FILMS ON DIFFERENT SUBSTRATES

2019 ◽  
Vol 27 (05) ◽  
pp. 1950150 ◽  
Author(s):  
SYED HAMMAD RAZA ◽  
NAVEED AFZAL ◽  
MOHSIN RAFIQUE ◽  
M. IMRAN ◽  
R. AHMAD
Keyword(s):  
Annealing Temperature ◽  
Morphological Changes ◽  
Rf Magnetron Sputtering ◽  
Morphological Properties ◽  
X Ray Diffraction ◽  
Si Substrates ◽  
Optical Modes ◽  
Diffraction Peaks ◽  
The Fourier Transform ◽  
Deposited Films

Molybdenum oxide (MoO3) films were deposited on glass, Al, Mo and Si substrates at room temperature in Ar-O2 plasma by RF magnetron sputtering system. The as-deposited films were annealed in air at 400∘C and 500∘C. X-ray diffraction (XRD) results revealed that films annealed at 400∘C on all the substrates exhibited diffraction peaks of orthorhombic (α) and monoclinic (β) phases of MoO3. By increasing the annealing temperature to 500∘C, the [Formula: see text]-MoO3 phase on glass became more significant when compared with the [Formula: see text]-MoO3 phase. In contrast, the [Formula: see text]-MoO3 phase was more prominent in the case of film grown on the Mo substrate. The Fourier transform infrared spectroscopy (FTIR) analysis indicated stretching vibrational modes of Mo[Formula: see text]O and transverse optical modes of Mo-O-Mo on all the substrates. The surface morphology of MoO3 films on glass shows a flat surface at 400∘C that was changed into a layered-like structure at 500∘C. In the case of MoO3 films on Al and Si, arbitrary-shaped particles were transformed into needle and rod shapes, respectively, with increase of annealing temperature from 400∘C to 500∘C. The film annealed on Mo substrate at 400∘C revealed corrugated particles that were changed into coarse and elongated particles at 500∘C. The morphological changes in MoO3 film with increase of annealing temperature were associated with tensile strain developed inside MoO3 due to lattice and thermal mismatch between the film and the substrate.

scholarly journals Magnetron sputtering technique for analyzing the influence of RF sputtering power on microstructural surface morphology of aluminum thin films deposited on SiO2/Si substrates

2021 ◽  
Vol 127 (10) ◽  
Author(s):  
Somayeh Asgary ◽  
Elnaz Vaghri ◽  
Masoumeh Daemi ◽  
Parisa Esmaili ◽  
Amir H. Ramezani ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Sputtering ◽  
Rf Power ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Sputtering Power ◽  
Microstructural Surface ◽  
Deposited Films

AbstractIn this research, aluminum (Al) thin films were deposited on SiO2/Si substrates using RF magnetron sputtering technique for analyzing the influence of RF sputtering power on microstructural surface morphologies. Different sputtering RF powers (100–400 W) were employed to form Al thin films. The characteristics of deposited Al thin films are investigated using X-ray diffraction pattern (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and Fourier-transforms infrared (FTIR) spectroscopy. The X-ray diffraction (XRD) results demonstrate that the deposited films in low sputtering power have amorphous nature. By increasing the sputtering power, crystallization is observed. AFM analysis results show that the RF power of 300 W is the optimum sputtering power to grow the smoothest Al thin films. FTIR results show that the varying RF power affect the chemical structure of the deposited films. The SEM results show that by increasing the sputtering power leads to the formation of isolated texture on the surface of substrate. In conclusion, RF power has a significant impact on the properties of deposited films, particularly crystallization and shape.

scholarly journals Modulation Effect of Hardness on the Friction Coefficient and Its Mechanism Analysis of ZrB2/Mo Multilayers Synthesized by Magnetron Sputtering

Crystals ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 69
Author(s):  
Tingjia Zhang ◽  
Lei Dong ◽  
Jie Wu ◽  
Dejun Li
Keyword(s):  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Mechanism Analysis ◽  
Friction Behavior ◽  
Covalent Bonds ◽  
Maximum Value ◽  
Opposite Change ◽  
Different Temperatures ◽  
Ionic Bonds ◽  
The Stability

ZrB2/Mo multilayers were prepared by the magnetron sputtering technique on Si (100) and Al2O3 (001) substrates. The friction behavior and wear mechanism of the multilayers were tested at variable modulation ratios (tZrB2:tMo) of 1:1 to 8:1 at different temperatures. Under the influence of an effective modulation ratio and temperature, the friction coefficient and hardness of ZrB2/Mo multilayers showed an almost opposite change rule, that is, the higher the hardness, the lower the friction coefficient. The hardness and elastic modulus reached the maximum value (26.1 GPa and 241.99 GPa) at tZrB2:tMo = 5:1 and the corresponding friction coefficient was 0.86. Meanwhile, the hardness and average friction coefficient at 500 °C were, respectively, 8.9 GPa and 1.23. First-principles calculations of the interface model of ZrB2 (001)/Mo (110) showed that the ionic bonds and covalent bonds at the interface can effectively improve the viscosity of the multilayer and the stability of the interface, and thus increase the hardness. This also indicated that the variation of the friction coefficient was mainly determined by the stability of the interface in the ZrB2/Mo multilayers.

XPS STUDY OF DIAMOND-LIKE CARBON-BASED NANOCOMPOSITE FILMS

2004 ◽  
Vol 03 (06) ◽  
pp. 797-802 ◽  
Author(s):  
S. ZHANG ◽  
Y. Q. FU ◽  
X. L. BUI ◽  
H. J. DU
Keyword(s):  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Nanocomposite Films ◽  
Diamond Like Carbon ◽  
Xps Analysis ◽  
X Ray ◽  
Xps Study ◽  
Carbon Based

X-ray photoelectron spectroscopy (XPS) analysis of amorphous carbon ( a - C )-based nanocomposite films has been carried out. Four bonding types of carbon are revealed from the C 1s spectra: C – C sp 2 and sp 3 bonding, C – O and C – Ti bonding. With the introduction of Ti and Al into the a - C matrix, the carbon sp 3/ sp 2 ratio decreases significantly. XPS results also confirm that the Al doped in the film basically exists as an elemental Al in the a - C matrix, and the titanium is mostly bonded with carbon to form nc - TiC .

The Effects of Ag Addition on the Microstructure and Mechanical Properties of TiAlSiN Films

2013 ◽  
Vol 421 ◽  
pp. 304-307
Author(s):  
Chang Jie Feng ◽  
Yuan Fei Jiang ◽  
Shui Lian Hu ◽  
Ya Zhou
Keyword(s):  
Mechanical Properties ◽  
Wear Resistance ◽  
Friction Coefficient ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Ag Addition ◽  
Microstructure And Mechanical Properties ◽  
Diffraction Peaks ◽  
Ag Film ◽  
Microhardness Tester

Adding a low content of soft metals (such as Ag, Au, Cu, etc) in TiN-based films can decrease the friction coefficient of the nitride films. To improve the mechanical properties of the TiAlSiN film, 4.5 at.% Ag was added in the TiAlSiN film. TiAlSiN and TiAlSiN/Ag films were deposited on AISI304 steel by magnetron sputtering using a Ti50Al40Si10target and a Ti50Al40Si10plus an Ag strip, respectively. The microstructure and mechanical properties of the films were investigated by SEM/EDS, XRD, a tribological machine and a microhardness tester. The results show that, with 4.5 at.% Ag addition, the surface morphology of the TiAlSiN film became rougher and its microhardness decreased from 1520±35 HV0.01to 1307±42 HV0.01. The preferred orientation of (111) of the TiAlSiN film changed to randomly and the diffraction peaks became broader due to the Ag addition. The friction coefficient of the TiAlSiN-Ag film decreased compared with the TiAlSiN film, but it showed inferior wear resistance due to its lower microhardness. The effects of Ag addition on the microstructure and mechanical properties of TiAlSiN films were discussed.

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