scholarly journals Optical and Electrical Properties of Thin Films of CuS Nanodisks Ensembles Annealed in a Vacuum and Their Photocatalytic Activity

2013 ◽  
Vol 2013 ◽  
pp. 1-9 ◽  
Author(s):  
J. Santos Cruz ◽  
S. A. Mayén Hernández ◽  
F. Paraguay Delgado ◽  
O. Zelaya Angel ◽  
R. Castanedo Pérez ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Hydrogen Peroxide ◽  
Photocatalytic Activity ◽  
Electrical Properties ◽  
Absolute Temperature ◽  
Glass Substrates ◽  
Transmission Electron ◽  
Different Temperatures ◽  
Blue Solution

Effects on the optical, electrical, and photocatalytic properties of undoped CuS thin films nanodisks vacuum annealed at different temperatures were investigated. The chemical bath prepared CuS thin films were obtained at 40°C on glass substrates. The grain size of13.5±3.5 nm was computed directly from high-resolution transmission electron microscopy (HRTEM) images. The electrical properties were measured by means of both Hall effect at room temperature and dark resistivity as a function of the absolute temperature 100–330 K. The activation energy values were calculated as 0.007, 0.013, and 0.013 eV for 100, 150, and 200°C, respectively. The energy band gap of the films varied in the range of 1.98 up to 2.34 eV. The photocatalytic activity of the CuS thin film was evaluated by employing the degradation of aqueous methylene blue solution in the presence of hydrogen peroxide. The CuS sample thin film annealed in vacuum at 150°C exhibited the highest photocatalytic activity in presence of hydrogen peroxide.

CuxSbySz THIN FILMS PRODUCED BY ANNEALING CHEMICALLY DEPOSITED Sb2S3-CuS THIN FILMS

2001 ◽  
Vol 15 (17n19) ◽  
pp. 667-670 ◽  
Author(s):  
Y. RODRÍGUEZ-LAZCANO ◽  
M. T. S. NAIR ◽  
P. K. NAIR
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Band Gap ◽  
Deposition Method ◽  
Photovoltaic Devices ◽  
Large Area ◽  
Electrical And Optical Properties ◽  
Ternary Compounds ◽  
Glass Substrates ◽  
Different Temperatures

The possibility of generating ternary compounds through annealing thin film stacks of binary composition has been demonstrated before. In this work we report a method to produce large area coating of ternary compounds through a reaction in solid state between thin films of Sb2S3 and CuS. Thin films of Sb2S3 -CuS were deposited on glass substrates in the sequence of Sb2S3 followed by CuS (on Sb2S3 ) using chemical bath deposition method. The multilayer stack, thus produced, of approximately 0.5 μm in thickness, where annealed under nitrogen and argon atmospheres at different temperatures to produce films of ternary composition, CuxSbySz . An optical band gap of ~1.5 eV was observed in these films, suggesting that the thin films of ternary composition formed in this way are suitable for use as absorber materials in photovoltaic devices. The results on the analyses of structural, electrical and optical properties of films formed with different combinations of thickness in the multilayers will be discussed in the paper.

scholarly journals Residual Oxygen Effects on the Properties of MoS2 Thin Films Deposited at Different Temperatures by Magnetron Sputtering

Crystals ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1183
Author(s):  
Peiyu Wang ◽  
Xin Wang ◽  
Fengyin Tan ◽  
Ronghua Zhang
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Deposition Temperature ◽  
Energy Dispersive Spectrometer ◽  
Rf Magnetron Sputtering ◽  
Glass Substrates ◽  
Different Temperatures ◽  
Oxygen Atoms

Molybdenum disulfide (MoS2) thin films were deposited at different temperatures (150 °C, 225 °C, 300 °C, 375 °C, and 450 °C) on quartz glass substrates and silicon substrates using the RF magnetron sputtering method. The influence of deposition temperature on the structural, optical, electrical properties and deposition rate of the obtained thin films was investigated by X-ray diffraction (XRD), Energy Dispersive Spectrometer (EDS), Raman, absorption and transmission spectroscopies, a resistivity-measuring instrument with the four-probe method, and a step profiler. It was found that the MoS2 thin films deposited at the temperatures of 150 °C, 225 °C, and 300 °C were of polycrystalline with a (101) preferred orientation. With increasing deposition temperatures from 150 °C to 300 °C, the crystallization quality of the MoS2 thin films was improved, the Raman vibrational modes were strengthened, the deposition rate decreased, and the optical transmission and bandgap increased. When the deposition temperature increased to above 375 °C, the molecular atoms were partially combined with oxygen atoms to form MoO3 thin film, which caused significant changes in the structural, optical, and electrical properties of the obtained thin films. Therefore, it was necessary to control the deposition temperature and reduce the contamination of oxygen atoms throughout the magnetron sputtering process.

Effects of Substrate Temperature on the Properties of Silicon Oxide Films by PECVD

2012 ◽  
Vol 198-199 ◽  
pp. 28-31
Author(s):  
Chun Ya Li ◽  
Xi Feng Li ◽  
Long Long Chen ◽  
Ji Feng Shi ◽  
Jian Hua Zhang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Properties ◽  
Photoelectron Spectroscopy ◽  
Deposition Temperature ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Growth Conditions ◽  
X Ray ◽  
Glass Substrates

Under different growth conditions, silicon Oxide (SiOx) thin films were deposited successfully on Si (100) substrates and glass substrates by plasma enhanced chemical vapor deposition (PECVD). The thickness, refractive index and growth rate of the thin films were tested by ellipsometer. The effects of deposition temperature on the structure and properties of SiOx films were studied using X ray diffraction (XRD), X ray photoelectron spectroscopy (XPS) and UV-Visible spectroscopy. The results show that the SiOx films were amorphous at different deposition temperature. The peaks of Si2p and O1s shifted to higher binding energy with temperature increasing. The SiOx films had high transmissivity at the range of 400-900nm. By analyzing the observation and data, the influence of deposition parameters on the electrical properties and interface characteristics of SiOx thin film prepared by PECVD is systematically discussed. At last, SiOx thin film with excellent electrical properties and good interface characteristic is prepared under the relatively optimum parameters.

scholarly journals STUDYING THE TRANSPARENT AND ELECTRICAL PROPERTIES OF ZnO:Ti THIN FILM WHICH IS PREPARED BY DC MAGNETRON SPUTTERINGSPUTTERING

2009 ◽  
Vol 12 (12) ◽  
pp. 59-64
Author(s):  
Binh Van Ho ◽  
Hung Vu Tuan Le ◽  
Nhien Thi Ngoc Nguyen ◽  
Dat Thanh Huynh ◽  
Phuong Ai Duong ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Resistivity ◽  
Electrical Properties ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Glass Substrates ◽  
Conductive Oxide ◽  
Doped Zno ◽  
Ceramic Targets

The Ti-doped Zno films were deposited onto glass substrates from ceramic targets ZnO with various Ti concentrations using a DC magnetron sputtering. The experimental results show that all thin films are transparent and conductive oxide films, with the appropriate Ti concentration (⁓1.5% Ti), the conductance of films can be improved. Optical characteristics of thin films was determined by UV-V is spectroscopy. The thickness of thin films was measured by Stylus method. The electrical resistivity was measured by four-point probe, and the roughness of films was determined by AFM.

scholarly journals Effect of Annealing Time of TiO2 Thin Film Deposited by Spray Pyrolysis Deposition Method for Dye-Sensitized Solar Cell Application

2015 ◽  
Vol 773-774 ◽  
pp. 647-651
Author(s):  
Noor Sakinah Khalid ◽  
Siti Harwani Ishak ◽  
Mohd Khairul Ahmad
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Solar Cell ◽  
Electrical Properties ◽  
Spray Pyrolysis ◽  
Annealing Time ◽  
Low Cost ◽  
Spray Pyrolysis Method ◽  
Solar Cell Application ◽  
Glass Substrates

Titanium oxide (TiO2) thin films were deposited onto glass substrates by spray pyrolysis method. The thin films were deposited at three different annealing time; 1, 5 and 10 hours at 400°C. The structural and electrical properties were characterized using FESEM and I-V characteristic. Polycrystalline thin film with anatase crystal structure, as evidenced from X-ray diffraction pattern, was obtained with major reflection along (101). Electrical properties have been studied by means of electrical resistivity. The dark resistivity had been measured as a function of the film thickness, d. The resistivity of samples had been found to decrease with decreasing thickness. Thus, TiO2 is one of the most promising candidates for relatively low cost, simple manufacture for solar cell.

scholarly journals Optical and electrical properties of (Ti-V)Ox thin film as n-type Transparent Oxide Semiconductor

2014 ◽  
Vol 62 (3) ◽  
pp. 583-588
Author(s):  
M. Mazur ◽  
J. Domaradzki ◽  
D. Wojcieszak
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Properties ◽  
High Energy ◽  
Oxide Semiconductor ◽  
Optical And Electrical Properties ◽  
Electrical Measurements ◽  
Glass Substrates ◽  
Vanadium Doping ◽  
Transparent Oxide

Abstract In this paper, the influence of vanadium doping on optical and electrical properties of titanium dioxide thin films has been discussed. The (Ti-V)Ox thin films was deposited on silicon and Corning glass substrates using high energy reactive magnetron sputtering process. Measurements performed with the aid of x-ray diffraction revealed, that deposited thin film was composed of nanocrystalline mixture of TiO2-anatase, V2O3 and β-V2O5 phases. The amount of vanadium in the thin film, estimated on the basis of energy dispersive spectroscopy measurement, was equal to 3 at. %. Optical properties were evaluated based on transmission and reflection measurements. (Ti-V)Ox thin film was well transparent and the absorption edge was shifted by only 11 nm towards longer wavelengths in comparison to undoped TiO2. Electrical measurements revealed, that investigated thin film was transparent oxide semiconductors with n-type electrical conduction and resistivity of about 2.7 · 105 Ωcm at room temperature. Additionally, measured I-V characteristics of TOS-Si heterostructure were nonlinear and asymmetrical.

scholarly journals Optical, Electrical and Photocatalytic Properties of the Ternary SemiconductorsZnxCd1-xS,CuxCd1-xSandCuxZn1-xS

2014 ◽  
Vol 2014 ◽  
pp. 1-8 ◽  
Author(s):  
Sandra Andrea Mayén-Hernández ◽  
David Santos-Cruz ◽  
Francisco de Moure-Flores ◽  
Sergio Alfonso Pérez-García ◽  
Liliana Licea-Jiménez ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Photocatalytic Properties ◽  
Energy Band Gap ◽  
Amorphous Thin Films ◽  
Semiconductor Thin Films ◽  
Different Temperatures ◽  
Blue Solution ◽  
Ternary Semiconductor ◽  
Van Der Pauw

The effects of vacuum annealing at different temperatures on the optical, electrical and photocatalytic properties of polycrystalline and amorphous thin films of the ternary semiconductor alloysZnxCd1-xS,CuxCd1-xSandCuxZn1-xSwere investigated in stacks of binary semiconductors obtained by chemical bath deposition. The electrical properties were measured at room temperature using a four-contact probe in the Van der Pauw configuration. The energy band gap of the films varied from 2.30 to 2.85 eV. The photocatalytic activity of the semiconductor thin films was evaluated by the degradation of an aqueous methylene blue solution. The thin film ofZnxCd1-xSannealed under vacuum at 300°C exhibited the highest photocatalytic activity.

Thin Films of Titanium Dioxide Prepared by Chemical Routes using Novel Precursors

2002 ◽  
Vol 755 ◽  
Author(s):  
K. Shalini ◽  
S. Chandrasekaran ◽  
S.A. Shivashankar
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Film Growth ◽  
Anatase Phase ◽  
Chemical Vapor ◽  
Inert Atmosphere ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Transmission Electron ◽  
Different Temperatures

ABSTRACTNovel, volatile, stable, oxo-β-ketoesterate complexes of titanium, whose synthesis requires only an inert atmosphere, as opposed to a glove box, have been developed. Using one of the complexes as the precursor, thin films of TiO2 have been deposited on glass substrates by metalorganic chemical vapor deposition (MOCVD) at temperatures ranging from 400°C to 525°C and characterized by scanning electron microscopy, transmission electron microscopy, and atomic force microscopy. All the films grown in this temperature range are very smooth; those grown above 480°C consist of nearly monodisperse, nanocrystals of the anatase phase. Optical studies show the bandgaps in the range 3.4–3.7 eV for films grown at different temperatures. Thin films of anatase TiO2 have also been grown by spin-coating technique using another ketoesterate complex of titanium, demonstrating that the newly developed complexes can be successfully used for thin film growth by various chemical routes.

Influence of Hydrogen Dilution on Electrical Properties of Amorphous Silicon Thin Films Deposited on Glass Substrates

2011 ◽  
Vol 221 ◽  
pp. 117-122
Author(s):  
Ying Ge Li ◽  
Dong Xing Du
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Properties ◽  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Dark Conductivity ◽  
Thin Layers ◽  
Glass Substrates ◽  
Silicon Thin Films ◽  
Hydrogen Dilution

Thin film Amorphous Silicon materials have found wide application in photovoltaic industry. In this paper, thin layers (around 300nm) of intrinsic hydrogenated amorphous silicon (a-Si:H) are fabricated on glass (Corning Eagle2000TM) substrates by employing plasma enhanced chemical vapor deposition (PECVD) system with gas sources of silane and hydrogen. The deposited thin films are proven to be material of amorphous silicon by Raman spectroscopy measurement and their electronic transport properties are thoroughly characterized in terms of photoconductivity, dark conductivity and photo response. The effect of Hydrogen dilution on electrical properties are investigated for a-Si:H thin films deposited in the temperatures range of 150~200°C. Results indicate that a-Si:H thin films on glass substrate owns device-quality electrical properties and could be applied on fabricating thin film solar cells as the absorber layer material and on other photovoltaic or photo electronic devices.

Microstructure of Ca3Co4O9 Single Crystals and Thin Films

2005 ◽  
Vol 886 ◽  
Author(s):  
Yufeng Hu ◽  
Eli Sutter ◽  
Weidong Si ◽  
Qiang Li
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Single Crystal ◽  
Single Crystals ◽  
Single Crystal Sample ◽  
X Ray Diffraction ◽  
Crystal Sample ◽  
Lattice Constants ◽  
Glass Substrates ◽  
Transmission Electron

ABSTRACTWe present a comparative study of the microstructure of Ca3Co4O9 single crystals and c-axis oriented Ca3Co4O9 thin films grown on glass substrates. Though both crystals and films have similar values of Seekbeck coefficient and electric resistivity at room temperature, their microstructures are rather different. Extensive high resolution transmission electron microscopy (TEM) studies reveal that the films grown on glass substrates have abundant stacking faults, which is in contrast to the perfect crystalline structure found in the single crystal sample. The c-axis lattice constants derived from the x-ray diffraction (XRD) and TEM measurements for the single crystal sample and the thin film are virtually the same, suggesting that the thin film on the glass substrate was not strained.

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