In SituChemical Oxidation of UltrasmallMoOxNanoparticles in Suspensions
Nanoparticle suspensions represent a promising route toward low cost, large area solution deposition of functional thin films for applications in energy conversion, flexible electronics, and sensors. However, parameters such size, stoichiometry, and electronic properties must be controlled to achieve best results for the target application. In this report, we demonstrate that such control can be achieved viain situchemical oxidation ofMoOxnanoparticles in suspensions. Starting from a microwave-synthesized suspension of ultrasmall (d~2 nm)MoOxnanoparticles in n-butanol, we added H2O2at room temperature to chemically oxidize the nanoparticles. We systematically varied H2O2concentration and reaction time and found that they significantly affected oxidation state and work function ofMoOxnanoparticle films. In particular, we achieved a continuous tuning ofMoOxwork function from 4.4 to 5.0 eV, corresponding to oxidation of as-synthesizedMoOxnanoparticle (20% Mo6+) to essentially pure MoO3. This was achieved without significantly modifying nanoparticle size or stability. Such precise control ofMoOxstoichiometry and work function is critical for the optimization ofMoOxnanoparticles for applications in organic optoelectronics. Moreover, the simplicity of the chemical oxidation procedure should be applicable for the development of other transition oxide nanomaterials with tunable composition and properties.