scholarly journals Factors Influencing the Stability of Au-Incorporated Metal-Oxide Supported Thin Films for Optical Gas Sensing

2017 ◽  
Vol 164 (4) ◽  
pp. B159-B167 ◽  
Author(s):  
John P. Baltrus ◽  
Gordon R. Holcomb ◽  
Joseph H. Tylczak ◽  
Paul R. Ohodnicki
Author(s):  
Jian Ping Xing ◽  
Juan Li ◽  
Lei Zhou ◽  
Jian Ming Li ◽  
Nan Yuan Qiu

2002 ◽  
Vol 85 (1) ◽  
pp. 55-60 ◽  
Author(s):  
D. J. Walton ◽  
I. R. Peterson ◽  
L. S. Miller ◽  
A. Bradford ◽  
O. Worsfold ◽  
...  

2013 ◽  
Vol 1560 ◽  
Author(s):  
G. Bahar Basim ◽  
Ayse Karagoz ◽  
Zeynep Ozdemir

ABSTRACTMetal CMP applications necessitate the formation of a protective oxide film in the presence of surface active agents, oxidizers, pH regulators and other chemicals to achieve global planarization. Formation and mechanical properties of the chemically modified metal oxide thin films in CMP determine the stresses develop at the interfaces delineating the stability and protective nature of the chemically altered films on the surface of the metal wafer. The balance between the stresses built in the film structure versus the mechanical actions provided during the process can be used to optimize the process variables and furthermore help define new planarization techniques for the next generation microelectronic device manufacturing. In this study, the preliminary studies were concentrated on the very well established tungsten CMP applications and furthermore, titanium CMP applications were presented as a part of surface nano-structuring methodology for biomedical applications by stressing the synergistic effect of protective metal oxide film of titanium in this advanced application.


Author(s):  
M. TONEZZER ◽  
A. QUARANTA ◽  
E. NEGRO ◽  
G. DELLA MEA ◽  
G. MAGGIONI ◽  
...  

2012 ◽  
Vol 111 (6) ◽  
pp. 064320 ◽  
Author(s):  
Paul R. Ohodnicki ◽  
Congjun Wang ◽  
Sittichai Natesakhawat ◽  
John P. Baltrus ◽  
Thomas D. Brown

2020 ◽  
Vol MA2020-01 (33) ◽  
pp. 2383-2383
Author(s):  
Michele Rigon ◽  
Alessandro Longato ◽  
Valentina Paolucci ◽  
Carlo Cantalini ◽  
Alessandro Martucci

2000 ◽  
Vol 109 (1-3) ◽  
pp. 91-96 ◽  
Author(s):  
D.J. Walton ◽  
L.S. Miller ◽  
I.R. Peterson ◽  
A. Bradford ◽  
O. Worsfold ◽  
...  

2008 ◽  
Vol 55-57 ◽  
pp. 285-288 ◽  
Author(s):  
C. Oros ◽  
Anurat Wisitsoraat ◽  
Pichet Limsuwan ◽  
M. Horpathum ◽  
V. Patthanasettakul ◽  
...  

Metal oxide thin film materials, including SnO2, TiO2, WO3, MoO3, ZnO, have been widely studied for gas sensing applications. However, new gas-sensing materials with distinct and diverse characteristics for new sensing applications such as electronic nose are still being explored. Presently, gas sensing properties of other metal oxides have not yet been extensively explored. Chromium oxide is an interesting metal oxide for gas sensor because of its temperature stability and moderate electrical conductivity. Nevertheless, there have been very few studies on gas sensing behaviors of this material. In this work, chromium oxide thin films were systematically studied by reactive sputtering with varying sputtering parameter including oxygen flow rate. Structural characterization by means of scanning electron microscopy and X-ray diffraction reveals that the films have sub-micometer grain-size with Rhombohedral phase of Cr2O3. Gas-sensing performances of sputtered chromium oxide thin film have been characterized toward ethanol and acetylene sensing. It was found that chromium oxide thin films exhibit p-type conductivity with increased resistance when exposed to ethanol and acetylene, which are reducing gases. In addition, sensitivity to both acetylene and ethanol tend to improve as oxygen flow rate increases. Furthermore, the chromium oxide thin films exhibit high sensitivity at moderate temperature of 250-300 °C with minimum operating temperature of 200 °C.


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