Film Thickness Prediction of Poly-Silicon LPCVD Process with a Simplified Two-Step Surface Reaction Model

2013 ◽  
Vol 2 (9) ◽  
pp. N182-N186 ◽  
Author(s):  
Kimihisa Kaneko ◽  
Masaaki Ogino ◽  
Ryosuke Shimizu ◽  
Mitsuo Koshi ◽  
Yukihiro Shimogaki
Keyword(s):  
Film Thickness ◽  
Surface Reaction ◽  
Reaction Model ◽  
Poly Silicon ◽  
Thickness Prediction ◽  
Surface Reaction Model

scholarly journals Stability Analysis of a Bulk–Surface Reaction Model for Membrane Protein Clustering

2020 ◽  
Vol 82 (2) ◽  
Author(s):  
Lucas M. Stolerman ◽  
Michael Getz ◽  
Stefan G. Llewellyn Smith ◽  
Michael Holst ◽  
Padmini Rangamani
Keyword(s):  
Stability Analysis ◽  
Membrane Protein ◽  
Surface Reaction ◽  
Reaction Model ◽  
Protein Clustering ◽  
Bulk Surface ◽  
Membrane Protein Clustering ◽  
Surface Reaction Model

scholarly journals A Dry Etching Simulation with a New Surface Reaction Model.

Shinku ◽  
1992 ◽  
Vol 35 (11) ◽  
pp. 925-934 ◽  
Author(s):  
Kenji HARAFUJI ◽  
Akio MISAKA ◽  
Masafumi KUBOTA ◽  
Noboru NOMURA
Keyword(s):  
Surface Reaction ◽  
Dry Etching ◽  
Reaction Model ◽  
Surface Reaction Model

A unified semi-global surface reaction model of polymer deposition and SiO2 etching in fluorocarbon plasma

2020 ◽  
Vol 515 ◽  
pp. 145975 ◽  
Author(s):  
Won Seok Chang ◽  
Yeong Geun Yook ◽  
Hae Sung You ◽  
Jae Hyeong Park ◽  
Deuk Chul Kwon ◽  
...  
Keyword(s):  
Surface Reaction ◽  
Reaction Model ◽  
Fluorocarbon Plasma ◽  
Polymer Deposition ◽  
Global Surface ◽  
Surface Reaction Model ◽  
Sio2 Etching
Sign in / Sign up

Export Citation Format

Share Document