Dry etching topography simulator with a new surface reaction model: MODERN

1995 ◽  
Vol 42 (11) ◽  
pp. 1903-1911 ◽  
Author(s):  
K. Harafuji ◽  
A. Misaka
Keyword(s):  
Surface Reaction ◽  
Dry Etching ◽  
Reaction Model ◽  
Surface Reaction Model

scholarly journals A Dry Etching Simulation with a New Surface Reaction Model.

Shinku ◽  
1992 ◽  
Vol 35 (11) ◽  
pp. 925-934 ◽  
Author(s):  
Kenji HARAFUJI ◽  
Akio MISAKA ◽  
Masafumi KUBOTA ◽  
Noboru NOMURA
Keyword(s):  
Surface Reaction ◽  
Dry Etching ◽  
Reaction Model ◽  
Surface Reaction Model

Novel Surface Reaction Model in Dry-Etching Process Simulator

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4363-4369 ◽  
Author(s):  
Akio Misaka ◽  
Kenji Harafuji ◽  
Masafumi Kubota ◽  
Noboru Nomura
Keyword(s):  
Surface Reaction ◽  
Dry Etching ◽  
Reaction Model ◽  
Etching Process ◽  
Process Simulator ◽  
Surface Reaction Model

scholarly journals Stability Analysis of a Bulk–Surface Reaction Model for Membrane Protein Clustering

2020 ◽  
Vol 82 (2) ◽  
Author(s):  
Lucas M. Stolerman ◽  
Michael Getz ◽  
Stefan G. Llewellyn Smith ◽  
Michael Holst ◽  
Padmini Rangamani
Keyword(s):  
Stability Analysis ◽  
Membrane Protein ◽  
Surface Reaction ◽  
Reaction Model ◽  
Protein Clustering ◽  
Bulk Surface ◽  
Membrane Protein Clustering ◽  
Surface Reaction Model

A unified semi-global surface reaction model of polymer deposition and SiO2 etching in fluorocarbon plasma

2020 ◽  
Vol 515 ◽  
pp. 145975 ◽  
Author(s):  
Won Seok Chang ◽  
Yeong Geun Yook ◽  
Hae Sung You ◽  
Jae Hyeong Park ◽  
Deuk Chul Kwon ◽  
...  
Keyword(s):  
Surface Reaction ◽  
Reaction Model ◽  
Fluorocarbon Plasma ◽  
Polymer Deposition ◽  
Global Surface ◽  
Surface Reaction Model ◽  
Sio2 Etching
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