Effects of Ar Plasma Treatment on the Properties of TaN/Ta Barrier for Copper Interconnects in Advanced 3D NAND Memory

2019 ◽  
Vol 8 (12) ◽  
pp. P764-P767 ◽  
Author(s):  
Xianglie Sun ◽  
Shuliang Lv ◽  
Yuan Li ◽  
Jun Luo ◽  
Chi Huang ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Copper Interconnects ◽  
Ar Plasma

scholarly journals Effect of cold Ar plasma treatment on the catalytic performance of Pt/CeO2 in water-gas shift reaction (WGS)

2018 ◽  
Vol 225 ◽  
pp. 121-127 ◽  
Author(s):  
Laura Pastor-Pérez ◽  
Victor Belda-Alcázar ◽  
Carlo Marini ◽  
M. Mercedes Pastor-Blas ◽  
Antonio Sepúlveda-Escribano ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Catalytic Performance ◽  
Water Gas Shift ◽  
Water Gas Shift Reaction ◽  
Ar Plasma ◽  
Shift Reaction ◽  
Water Gas

Modification of thermally reduced graphene oxide by the SF6/Ar plasma treatment

2017 ◽  
Vol 8 (5) ◽  
pp. 763-768 ◽  
Author(s):  
E. P. Neustroev ◽  
M. V. Nogovitcyna ◽  
V. I. Popov ◽  
V. B. Timofeev
Keyword(s):  
Graphene Oxide ◽  
Plasma Treatment ◽  
Reduced Graphene Oxide ◽  
Reduced Graphene ◽  
Ar Plasma

Effects of Ar Plasma Treatment on Photoluminescence Properties of GaAs Nanowires

2019 ◽  
Vol 46 (2) ◽  
pp. 0211005
Author(s):  
高美 Gao Mei ◽  
李浩林 Li Haolin ◽  
王登魁 Wang Dengkui ◽  
王新伟 Wang Xinwei ◽  
方铉 Fang Xuan ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Photoluminescence Properties ◽  
Gaas Nanowires ◽  
Ar Plasma

Effect of Br gassing after Ar plasma treatment of polyolefins

2013 ◽  
Vol 27 (16) ◽  
pp. 1828-1839 ◽  
Author(s):  
Maalolan Ramanujam ◽  
Renate Mix ◽  
Manfred Wagner ◽  
Jörg F. Friedrich
Keyword(s):  
Plasma Treatment ◽  
Ar Plasma

Improvement on Intrinsic Electrical Properties of Low-k Hydrogen Silsesquioxane/Copper Interconnects Employing Deuterium Plasma Treatment

2000 ◽  
Vol 147 (3) ◽  
pp. 1186 ◽  
Author(s):  
Po-Tsun Liu ◽  
Ting-Chang Chang ◽  
Ya-Liang Yang ◽  
Yi-Fang Cheng ◽  
Jae-Kyun Lee ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Plasma Treatment ◽  
Copper Interconnects ◽  
Deuterium Plasma ◽  
Hydrogen Silsesquioxane ◽  
Low K

How tantalum proceeds phase change on tantalum nitride underlayer with sequential Ar plasma treatment

2013 ◽  
Vol 137 (3) ◽  
pp. 689-693 ◽  
Author(s):  
Jung-Chih Tsao ◽  
Chuan-Pu Liu ◽  
Hsin-Chiao Fang ◽  
Ying-Lang Wang
Keyword(s):  
Phase Change ◽  
Plasma Treatment ◽  
Tantalum Nitride ◽  
Ar Plasma
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