Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

2012 ◽  
Vol 1 (6) ◽  
pp. P255-P262 ◽  
Author(s):  
I. J. M. Erkens ◽  
A. J. M. Mackus ◽  
H. C. M. Knoops ◽  
P. Smits ◽  
T. H. M. van de Ven ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Atomic Layer Deposition ◽  
Temperature Dependence ◽  
Film Growth ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Mass Spectrometry Study

In Situ Quadrupole Mass Spectrometry Study of Atomic-Layer Deposition of ZrO2Using Cp2Zr(CH3)2and Water

Langmuir ◽  
2005 ◽  
Vol 21 (16) ◽  
pp. 7321-7325 ◽  
Author(s):  
Jaakko Niinistö ◽  
Antti Rahtu ◽  
Matti Putkonen ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Quadrupole Mass ◽  
Quadrupole Mass Spectrometry ◽  
Layer Deposition ◽  
Mass Spectrometry Study

Temperature dependence of SiO2 film growth with plasma-enhanced atomic layer deposition

2012 ◽  
Vol 520 (11) ◽  
pp. 3994-3998 ◽  
Author(s):  
Akiko Kobayashi ◽  
Naoto Tsuji ◽  
Atsuki Fukazawa ◽  
Nobuyoshi Kobayashi
Keyword(s):  
Atomic Layer Deposition ◽  
Temperature Dependence ◽  
Film Growth ◽  
Atomic Layer ◽  
Sio2 Film ◽  
Layer Deposition

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

Sign in / Sign up

Export Citation Format

Share Document