scholarly journals Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition

2019 ◽  
Vol 123 (7) ◽  
pp. 4109-4115 ◽  
Author(s):  
N. Hornsveld ◽  
W.M.M. Kessels ◽  
M. Creatore
Keyword(s):  
Mass Spectrometry ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Mass Spectrometry Study

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

2012 ◽  
Vol 1 (6) ◽  
pp. P255-P262 ◽  
Author(s):  
I. J. M. Erkens ◽  
A. J. M. Mackus ◽  
H. C. M. Knoops ◽  
P. Smits ◽  
T. H. M. van de Ven ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Atomic Layer Deposition ◽  
Temperature Dependence ◽  
Film Growth ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Mass Spectrometry Study

In Situ Quadrupole Mass Spectrometry Study of Atomic-Layer Deposition of ZrO2Using Cp2Zr(CH3)2and Water

Langmuir ◽  
2005 ◽  
Vol 21 (16) ◽  
pp. 7321-7325 ◽  
Author(s):  
Jaakko Niinistö ◽  
Antti Rahtu ◽  
Matti Putkonen ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Quadrupole Mass ◽  
Quadrupole Mass Spectrometry ◽  
Layer Deposition ◽  
Mass Spectrometry Study

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

scholarly journals Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration

2017 ◽  
Vol 326 ◽  
pp. 281-290 ◽  
Author(s):  
Mari Napari ◽  
Manu Lahtinen ◽  
Alexey Veselov ◽  
Jaakko Julin ◽  
Erik Østreng ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Film Growth ◽  
Atomic Layer ◽  
Zno Film ◽  
Temperature Plasma ◽  
Reactor Configuration ◽  
Layer Deposition
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