A Chemical Vapor Deposited Silicon Rich Silicon Carbide P-N Junction Based Thin-Film Photovoltaic Solar Cell

2012 ◽  
Vol 1 (6) ◽  
pp. Q144-Q148 ◽  
Author(s):  
Chiao-Ti Lee ◽  
Ling-Hsuan Tsai ◽  
Yung-Hsiang Lin ◽  
Gong-Ru Lin
Keyword(s):  
Thin Film ◽  
Silicon Carbide ◽  
Solar Cell ◽  
Chemical Vapor ◽  
Photovoltaic Solar Cell ◽  
Chemical Vapor Deposited

New counter electrode of hot filament chemical vapor deposited graphene thin film for dye sensitized solar cell

2013 ◽  
Vol 222 ◽  
pp. 464-471 ◽  
Author(s):  
Hyung-Kee Seo ◽  
Minwu Song ◽  
Sadia Ameen ◽  
M. Shaheer Akhtar ◽  
Hyung Shik Shin
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
Counter Electrode ◽  
Chemical Vapor ◽  
Dye Sensitized Solar Cell ◽  
Dye Sensitized ◽  
Chemical Vapor Deposited ◽  
Hot Filament

Phosphorus-diffused silicon solar cell emitters with plasma enhanced chemical vapor deposited silicon carbide

2005 ◽  
Vol 87 (1-4) ◽  
pp. 667-674 ◽  
Author(s):  
A. Orpella ◽  
M. Vetter ◽  
R. Ferré ◽  
I. Martín ◽  
J. Puigdollers ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Solar Cell ◽  
Silicon Solar Cell ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited

The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744101 ◽  
Author(s):  
Bitao Chen ◽  
Yingke Zhang ◽  
Qiuping Ouyang ◽  
Fei Chen ◽  
Xinghua Zhan ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Double Layers ◽  
Crystalline Silicon Solar Cell

SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell.

Growth, Structural and Mechanical Characterization and Reliability of Chemical Vapor Deposited Co and Co3O4 Thin Films as Candidate Materials for Sensing Applications

2011 ◽  
Vol 495 ◽  
pp. 108-111 ◽  
Author(s):  
Vasiliki P. Tsikourkitoudi ◽  
Elias P. Koumoulos ◽  
Nikolaos Papadopoulos ◽  
Costas A. Charitidis
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Elastic Modulus ◽  
Data Storage ◽  
Mechanical Stability ◽  
Chemical Vapor ◽  
Magnetic Sensors ◽  
Functional Coatings ◽  
Sensing Applications ◽  
Chemical Vapor Deposited

The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4thin films on SiO2and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The produced thin films are characterized using nanoindentation technique and their nanomechanical properties (hardness and elastic modulus) are obtained. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure.

Ultraprecision Surface Grinding of Chemical Vapor Deposited Silicon Carbide for X-Ray Mirrors Using Resinoid-Bonded Diamond Wheels

CIRP Annals ◽  
1999 ◽  
Vol 48 (1) ◽  
pp. 277-280 ◽  
Author(s):  
Y. Namba ◽  
H. Kobayashi ◽  
H. Suzuki ◽  
K. Yamashita ◽  
N. Taniguchi
Keyword(s):  
Silicon Carbide ◽  
Chemical Vapor ◽  
Surface Grinding ◽  
X Ray ◽  
Chemical Vapor Deposited

Chemical-Vapor-Deposited Materials for High Thermal Conductivity Applications

MRS Bulletin ◽  
2001 ◽  
Vol 26 (6) ◽  
pp. 458-463 ◽  
Author(s):  
Jitendra S. Goela ◽  
Nathaniel E. Brese ◽  
Michael A. Pickering ◽  
John E. Graebner
Keyword(s):  
Thin Film ◽  
Thermal Conductivity ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Thermal Conductivity ◽  
Solid Materials ◽  
Chemical Vapor Deposited

Chemical vapor deposition (CVD) is an attractive method for producing bulk and thin-film materials for a variety of applications. In this method, gaseous reagents condense onto a substrate and then react to produce solid materials. The materials produced by CVD are theoretically dense, highly pure, and have other superior properties.

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