High Doping Density/High Electric Field, Stress and Heterojunction Effects on the Characteristics of CMOS Compatible p-n Junctions

2011 ◽  
Vol 158 (5) ◽  
pp. R27 ◽  
Author(s):  
E. Simoen ◽  
G. Eneman ◽  
M. Bargallo Gonzalez ◽  
D. Kobayashi ◽  
A. Luque Rodríguez ◽  
...  
Keyword(s):  
Electric Field ◽  
High Electric Field ◽  
Doping Density ◽  
Field Stress ◽  
Cmos Compatible

Study of defects induced by high‐electric‐field stress into a thin gate oxide (11 nm) of metal‐oxide‐semiconductor capacitors

1993 ◽  
Vol 74 (2) ◽  
pp. 1124-1130 ◽  
Author(s):  
Abdelillah El‐Hdiy ◽  
Guy Salace ◽  
Christian Petit ◽  
Marc Jourdain ◽  
Dominique Vuillaume
Keyword(s):  
Electric Field ◽  
Metal Oxide ◽  
Gate Oxide ◽  
Metal Oxide Semiconductor ◽  
High Electric Field ◽  
Oxide Semiconductor ◽  
Field Stress ◽  
Thin Gate Oxide

Degradation mechanism of InAlN/GaN based HFETs under high electric field stress

2012 ◽  
Author(s):  
Congyong Zhu ◽  
Mo Wu ◽  
Cemil Kayis ◽  
Fan Zhang ◽  
Xing Li ◽  
...  
Keyword(s):  
Electric Field ◽  
Degradation Mechanism ◽  
High Electric Field ◽  
Field Stress
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